Zobrazeno 1 - 7
of 7
pro vyhledávání: '"L. M. Mazanova"'
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 2:491-495
Binary and ternary copolymers of (meth)acrylic monomers of different chemical constitution are synthesized. The influence of the composition and molecular weight of copolymers on the sensitivity and contrast of resists based on them under exposure to
Publikováno v:
European Polymer Journal. 43:644-651
The chain-transfer constants through silicon hydrides in bulk polymerization of styrene and methyl methacrylate (MMA) were measured with using 15 organosilicon compounds belonging to four classes: oligoorganohydrosilanes, oligoorganohydrosiloxanes, d
Publikováno v:
Polymer Science Series A. 48:470-476
Amphiphilic polystyrene-poly(methacrylic acid) block copolymers of various compositions have been synthesized by free-radical polymerization via chain-transfer and hydrosilylation reactions, as established by viscometry, IR spectroscopy, and fraction
Publikováno v:
Polymer Science Series A. 48:266-271
The effect of structure of a photoacid generator (triarylsulfonium and diaryliodonium salts) on the trends of image formation in a chemically amplified resist based on a methyl methacrylate copolymer with methacrylic acid and ethoxyethyl methacrylate
Publikováno v:
Russian Journal of Applied Chemistry. 78:1166-1169
The polymerization of methyl methacrylate to high conversion in the presence of a series of disilanes as chain-transfer agents was studied, and the chain-transfer constants at low and high conversions were determined. The molecular-weight characteris
Autor:
L. M. Mazanova, A. Ya. Lopatin, N. N. Salashchenko, S. A. Bulgakova, S.A Molodnjakov, V. I. Luchin
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 448:487-492
A number of poly(meth)acrylates positive resists of various chemical structures were synthesized and the sensitivity of 0.2 μm resists films to soft X-ray radiation of a laser plasma source at a wavelength of 13 nm was investigated. We found that th
Autor:
N.N. Salashchenko, L. M. Mazanova, A. Y. Lopatin, Yu.D. Semchikov, V.I. Luchin, S. A. Bulgakova
Publikováno v:
1998 4th International Conference on Actual Problems of Electronic Instrument Engineering Proceedings. APEIE-98 (Cat. No.98EX179).
For the first time the method of chemical modification of polymethylmethacrylate (PMMA) as a positive radiation resist which allows 2-3 fold increase of PMMA sensitivity to radiation without the lost of its high resolution has been proposed. Organohy