Zobrazeno 1 - 10
of 21
pro vyhledávání: '"L. M. Amorim"'
Autor:
Tiago Matheus Nordi, Rodrigo Gounella, Marcio L. M. Amorim, Maximiliam Luppe, João Navarro Soares Junior, Joao L. Afonso, Vitor Monteiro, Jose A. Afonso, Erich Talamoni Fonoff, Eduardo Colombari, João Paulo Carmo
Publikováno v:
Journal of Low Power Electronics and Applications, Vol 14, Iss 2, p 28 (2024)
Deep-brain stimulation (DBS) is a highly effective and safe medical treatment that improves the lives of patients with a wide range of neurological and psychiatric diseases. It has been established as a first-line tool in the treatment of these condi
Externí odkaz:
https://doaj.org/article/d6f9f7e199e74e61ac8323212b5b3864
Autor:
Marcio L. M. Amorim, Gabriel Augusto Ginja, João Paulo Carmo, Melkzedekue Moraes Alcântara Moreira, Adriano Almeida Goncalves Siqueira, Jose A. Afonso
Publikováno v:
Energies, Vol 16, Iss 1, p 278 (2022)
This paper presents a low-cost/high-precision smart power supply for application on data loggers. The microprocessor unit is the brain of the system and manages the events and was optimized to provide electrical energy to the electronic devices under
Externí odkaz:
https://doaj.org/article/d8ddc1d4f9d94222bf7af6cb592c1691
Autor:
Ulrich Wahl, E. David-Bosne, L. M. C. Pereira, L. M. Amorim, André Vantomme, B. L. de Vries, M.R. da Silva, J. G. Correia, A. R. G. Costa
Publikováno v:
Journal of Applied Physics
The lattice location of ion implanted radioactive 24Na (t1/2=14.96 h) in GaN and AlN was determined using the emission channeling technique at the ISOLDE/CERN facility. In the room temperature as-implanted state in both GaN and AlN, the majority of t
Autor:
L. M. Amorim, Manuel Ribeiro da Silva, Ulrich Wahl, Lino Miguel da Costa Pereira, João P. Araújo, J. G. Correia, Daniel Silva
Publikováno v:
Applied Physics A. 123
We have studied the influence of electronic doping on the preferred lattice sites of implanted $${^{61}\text{Co}}$$ , and the related stabilities against thermal annealing, in silicon. Using the $$\beta ^-$$ emission channeling technique we have iden
Autor:
V. Augustyns, Ulrich Wahl, J. G. Correia, L. M. Amorim, E. David-Bosne, L. M. C. Pereira, D. J. Silva, A. R. G. Costa, M.R. da Silva
Publikováno v:
Semiconductor Science and Technology
Using radioactive isotopes produced at the CERN-ISOLDE facility, the lattice location of the implanted transition metal (TM) ions $^56$Mn, $^59$Fe and $^65$Ni in n-type single-crystalline hexagonal 6H-SiC was studied by means of the emission channeli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56f320649a824e6793c00c8547ec3ebc
http://cds.cern.ch/record/2665644
http://cds.cern.ch/record/2665644
Autor:
Ulrich Wahl, Daniel José Cardoso da Silva, Lino Miguel da Costa Pereira, Stefan Decoster, J. G. Correia, João P. Araújo, L. M. Amorim, Manuel Ribeiro da Silva
Publikováno v:
Applied Physics A. 122
Mn-doped Si has attracted significant interest in the context of dilute magnetic semiconductors. We investigated the lattice location of implanted Mn in silicon of different doping types (n, n+ and p+) in the highly dilute regime. Three different
Autor:
D. J. Silva, A. R. G. Costa, L. M. Amorim, V. Augustyns, M.R. da Silva, Krish Bharuth-Ram, E Bosne, J. G. Correia, L. M. C. Pereira, Ulrich Wahl
Publikováno v:
Journal of Physics D: Applied Physics
We have investigated the lattice location of implanted transition metal (TM) 56Mn, 59Fe and 65Ni ions in undoped single-crystalline cubic 3C–SiC by means of the emission channeling technique using radioactive isotopes produced at the CERN-ISOLDE fa
Autor:
A. R. G. Costa, Krish Bharuth-Ram, E. David-Bosne, P. Miranda, M.R. da Silva, J. G. Correia, V. Augustyns, L. M. Amorim, Ulrich Wahl, D. J. Silva, J. P. Araujo, Kristiaan Temst, André Vantomme, L. M. C. Pereira
We give an overview on the historical development and current program for lattice location studies at CERN’s ISOLDE facility, where the EC-SLI (Emission Channeling with Short-Lived Isotopes) collaboration maintains several setups for this type of e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f647dad469baa44895a2491ce27b0162
http://cds.cern.ch/record/2243054
http://cds.cern.ch/record/2243054
Autor:
Ulrich Wahl, L. M. C. Pereira, E Bosne, João P. Araújo, J. G. Correia, L. M. Amorim, Daniel Silva, M.R. da Silva
We have studied the lattice location of implanted nickel in silicon, for different doping types (n, n, and p). By means of on-line emission channeling, 65Ni was identified on three different sites of the diamond lattice: ideal substitutional sites, d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7590f1cb7edf6cceba9b6ae858a5f68a
https://lirias.kuleuven.be/handle/123456789/441364
https://lirias.kuleuven.be/handle/123456789/441364
Autor:
Yosuke Shimura, Sven Peters, N. M. Santos, Jean-Pierre Locquet, L. M. Amorim, Tatsuro Maeda, Kristiaan Temst, Noriyuki Uchida, Ruben Lieten, André Vantomme, Thierry Conard, Sergey I. Nikitenko, Claudia Fleischmann
Publikováno v:
ECS Journal of Solid State Science and Technology
ECS Journal of Solid State Science and Technology, IOP Science, 2014, 3 (12), pp.P403-P408. ⟨10.1149/2.0091412jss⟩
'ECS Journal of Solid State Science and Technology ', vol: 3, pages: P403-P408 (2014)
ECS Journal of Solid State Science and Technology, IOP Science, 2014, 3 (12), pp.P403-P408. ⟨10.1149/2.0091412jss⟩
'ECS Journal of Solid State Science and Technology ', vol: 3, pages: P403-P408 (2014)
International audience; We have investigated the structural and optical properties of metastable amorphous and crystalline GeSn layers on Si substrates. The as-deposited amorphous layers crystallize during annealing at 500 degrees C. This transition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32014bd14a17e39dc1bf8309775efe24
https://hal.archives-ouvertes.fr/hal-01572937
https://hal.archives-ouvertes.fr/hal-01572937