Výsledky vyhledávání - "L. D. Nikulina"

Thermal properties of some organosilicon precursors for chemical vapor deposition

Autor: A. V. Lis, I. P. Tsyrendorzhieva, V. I. Rakhlin, E. N. Ermakova, Pavel E. Plyusnin, R. E. Nikolaev, Sergey V. Sysoev, Marina Kosinova, L. D. Nikulina

Publikováno v: Journal of Thermal Analysis and Calorimetry. 126:609-616

Five volatile organosilicon compounds: trimethyl(phenyl)silane Me3SiC6H5 (I), trimethyl(cyclohexyl)silane Me3SiC6H11 (II), trimethyl(phenoxy)silane Me3SiOC6H5 (III), trimethyl(cyclohexyloxy)silane Me3SiOC6H11 (IV), and trimethyl(allyloxy)silane Me3Si

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::54a69a906f0dda26bd25a8262c72bdcf
https://doi.org/10.1007/s10973-016-5563-y

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Synthesis and characterization of organosilicon compounds as novel precursors for CVD processes

Autor: I. P. Tsyrendorzhieva, E. N. Ermakova, L. D. Nikulina, Marina Kosinova, Sergey V. Sysoev, V. I. Rakhlin

Publikováno v: Thermochimica Acta. 622:2-8

Chemical vapor deposition using single-source organosilicon precursors is one of the most effective ways to produce multifunctional SiCxNy films. It is worth mentioning that the precursor molecule design affects both the composition and properties of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8b0511605ee4bf87ff65019d67154965
https://doi.org/10.1016/j.tca.2015.02.004

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Synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine

Autor: V. I. Rakhlin, Sergey V. Sysoev, R. V. Pushkarev, B. A. Gostevskii, L. D. Nikulina, Marina Kosinova, I. S. Merenkov

Publikováno v: Glass Physics and Chemistry. 40:261-266

The synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine as a possible precursor for the preparation of SiBxCyNz films were carried out. The identity of the compound has bee

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8409130d864ce0b9cda0d832d2a12a9c
https://doi.org/10.1134/s1087659614020217

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Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2: New precursors for chemical vapor deposition processes

Autor: E. N. Ermakova, M. G. Voronkov, I. P. Tsyrendorzhieva, A. V. Lis, V. I. Rakhlin, L. D. Nikulina, Marina Kosinova, Sergey V. Sysoev

Publikováno v: Inorganic Materials. 49:363-367

We have synthesized the germanium- and tin-containing organosilicon compounds Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2 as new precursors for the preparation of materials by chemical vapor deposition. The compounds were characterized by NMR, IR and UV spectr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::847b59de8d61ee65ae20560ed64ad3bb
https://doi.org/10.1134/s0020168513040171

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N-substituted hexamethyldisilazanes as new substances for the synthesis of functional films in the system Si-Ge-C-N-H

Autor: Marina Kosinova, I. P. Tsyrendorzhieva, A. O. Kolontaeva, V. I. Rakhlin, M. G. Voronkov, A. A. Titov, L. D. Nikulina, Sergey V. Sysoev, A. V. Lis

Publikováno v: Russian Journal of General Chemistry. 81:2501-2505

N-Organylbis(trimethylsilyl)amines of the general formula RN(SiMe3)2 (R = Me3Si, Et3Ge) were synthesized by reaction of sodium bis(trimethylsilyl)amide with the corresponding trialkylsilyl(germyl) halide. Their IR, UV, and 1H, 13C, and 29Si NMR spect

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::23339fadf0e6b3378bc33aee06de7f55
https://doi.org/10.1134/s1070363211120140

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Properties of aminosilane precursors for the preparation of Si-C-N films

Autor: M. G. Voronkov, I. P. Tsirendorzhieva, V. I. Rakhlin, A. V. Lis, Marina Kosinova, Sergey V. Sysoev, L. D. Nikulina

Publikováno v: Inorganic Materials. 47:1324-1329

RnSi(NEt2)4 − n aminosilanes have been synthesized by reacting the RnSiCI4 − n (R = H, CH3; n = 1, 2) organylchlorosilanes with diethylamine. Using IR, UV, and NMR (1H, 13C, and 29Si) spectroscopies and elemental analysis, we have identified the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5c00fc34ac12a144972c0308c9bc62f7
https://doi.org/10.1134/s0020168511110227

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N-bromohexamethyldisilazane: Investigation of properties and thermodynamic simulation of precipitation of thin-layer structures from the vapor phase

Autor: L. D. Nikulina, M. G. Voronkov, T. A. Podgorbunskaya, V. I. Rakhlin, Sergey V. Sysoev, Marina Kosinova, L. I. Chernyavskii, A. A. Titov

Publikováno v: Glass Physics and Chemistry. 37:60-64

N-Bromohexamethyldisilazane has been characterized using an elemental analysis and IR, UV, 1H NMR, 13C NMR, and 29Si NMR spectroscopy. The spectral characteristics of the compound have been determined and the saturated vapor pressure has been measure

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::28154d7f79366f51b70f18e104cfccd9
https://doi.org/10.1134/s1087659611010123

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Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane

Autor: L. I. Chernyavskii, M. G. Voronkov, V. G. Kesler, E. A. Maximovskii, L. D. Nikulina, Fedor A. Kuznetsov, Yu. M. Rumyantsev, N. I. Fainer, V. I. Rakhlin, Marina Kosinova

Publikováno v: Glass Physics and Chemistry. 36:497-505

Silicon carbonitride films of different compositions have been synthesized by plasma-enhanced chemical vapor deposition with the use of trimethyl(diethylamino)silane as the initial compound. The conditions used for the deposition of the films have be

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bc0e05769f0fb9a65293574945d9c937
https://doi.org/10.1134/s1087659610040152

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Characterization of some trimethyl(organylamino)silanes—precursors for preparation of silicon carbonitride films

Autor: I. P. Tsirendorzhieva, M. G. Voronkov, V. I. Rakhlin, L. D. Nikulina, Marina Kosinova, Sergey V. Sysoev

Publikováno v: Glass Physics and Chemistry. 36:376-381

A series of aminosilanes has been synthesized by the reaction of carboxylic acid di(organyl)amides with trimethyliodsilane. A purification method providing an increase in the yield of end products to 82% has been developed. The identity of the produc

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::791c73b519ca9317b7f73cc1ac490eec
https://doi.org/10.1134/s1087659610030156

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Surface microstructure and morphology study of thin films produced from volatile fluorine-containing rare-earth β-diketonate complexes and their adducts

Autor: V. S. Danilovich, L. D. Nikulina, L. F. Bakhturova

Publikováno v: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 1:656-659

We present the results of a surface microstructure and morphology study of thin films produced from volatile fluorine-containing rare-earth β-diketonate complexes and their adducts. Films 0.2–0.4 μm in thickness were synthesized in vacuum by mean

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::379ceea1df779aad990b904019f75cd8
https://doi.org/10.1134/s1027451007060067

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