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pro vyhledávání: '"L. C. Hu"'
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Publikováno v:
Plasma Chemistry and Plasma Processing. 38:247-259
This study demonstrated the use of quadrupole mass spectrometry and optical emission spectrometry in diagnosing the plasma in the electron cyclotron resonance chemical vapor deposition (ECRCVD) process. The effects of adjusting the main magnetic coil
Publikováno v:
European review for medical and pharmacological sciences. 23(7)
This study aims to elucidate the potential mechanism of micro ribonucleic acid (miR)-21 in promoting fracture healing.30 male Sprague-Dawley rats were randomly divided into group A (phosphate-buffered saline, PBS, n=10), group B (AntagomiR-21, n=10)
Publikováno v:
IOP Conference Series: Earth and Environmental Science. 612:012062
In this study, a high-resolution (5km:1km) regional hydrometeorological simulation (Weather Research and Forecasting, WRF) in Southwest China was evaluated by comparisons with the multiple General Circulation Model (multi-GCM) ensemble mean from Coup
Publikováno v:
Key Engineering Materials. :92-100
The uniformity improvement of high deposition rate in hydrogenated amorphous silicon (a-Si:H) film deposited by electron cyclotron resonance chemical vapor deposition (ECR-CVD) is very essential for a large substrate in PV solar industry. In order to
Autor:
Y. Kawai, Y. W. Lin, Tomi T. Li, C. C. Lee, L. C. Hu, I-Chen Chen, Jenq Yang Chang, T. C. Wei, C. J. Wang
Publikováno v:
ECS Journal of Solid State Science and Technology. 4:P213-P219
We present the application of quadrupole mass spectrometry (QMS) with threshold ionization mass spectrometry (TIMS), optical emission spectroscopy (OES) with an actinometry method, and Langmuir probe (LP) as an integrated technique for in situ plasma
Autor:
Yu Lin Hsieh, I. Chen Chen, Chien Chien Lee, Ju Yi Lee, Jenq Yang Chang, Yen-Ho Chu, Shih Hung Wang, L. C. Hu, Tomi T. Li
Publikováno v:
ECS Transactions. 60:557-563
In this study, boron doped p-type hydrogenated silicon films were prepared by Electron Cyclotron Resonance Chemical Vapor Deposition (ECR-CVD) at lower temperature (<200℃) for solar cell. In order to analyze the optical and electrical property of
Autor:
I-Chen Chen, Tomi T. Li, Y. W. Lin, L. C. Hu, C. R. Yang, T. C. Wei, C. J. Wang, Jenq Yang Chang, S. K. Jou, C. C. Lee
Publikováno v:
2016 China Semiconductor Technology International Conference (CSTIC).
In this study, OES (Optical emission spectrometer) was used to diagnose the variations of plasma species. QMS (Quadrupole mass spectrometry) was utilized to examine the concentration of free radicals in plasma. The epitaxial silicon thin film was dep