Zobrazeno 1 - 10
of 15
pro vyhledávání: '"L. Binst"'
Publikováno v:
Thin Solid Films. 287:25-31
MoC x films were grown by d.c. reactive sputtering in an ArCH 4 atmosphere onto MgO (001) single-crystal surfaces. The crystallographic structure of the films was revealed by reflection and transmission high-energy electron diffraction. The micros
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3609cd67b947d8f7ab6bc06cf2e89237
https://doi.org/10.1016/s0040-6090(95)08230-1
https://doi.org/10.1016/s0040-6090(95)08230-1
Publikováno v:
Thin Solid Films. 249:150-154
Mo films were deposited on sintered polycrystalline MgO. These films exhibited, depending on deposition conditions, two different structures, namely the normal body-centered cubic and an abnormal face-centered cubic. The analysis performed by electro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e40e2d848ac606b415ea85f2555f0f5
https://doi.org/10.1016/0040-6090(94)90753-6
https://doi.org/10.1016/0040-6090(94)90753-6
Publikováno v:
Surface and Coatings Technology. 52:179-185
Using d.c. reactive sputtering of a molybdenum target, we have studied the effect of discharge power, substrate temperature and nitrogen pressure on molybdenum nitride formation. The crystallographic structure and composition of the deposited Mo-N fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a37604c3adecf3ea37e750435d8fa32d
https://doi.org/10.1016/0257-8972(92)90044-b
https://doi.org/10.1016/0257-8972(92)90044-b
Publikováno v:
Microscopy Microanalysis Microstructures. 1:189-197
The experimental conditions to condense epitaxial films of silver, palladium and silverpalladium alloys onto (100) air-cleaved MgO faces by glow discharge sputtering are related. The orientation (100)d//(100)s (where d indicates deposit and s substra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0586b84308d51761fe828be6dda7a195
https://doi.org/10.1051/mmm:0199000103018900
https://doi.org/10.1051/mmm:0199000103018900
Autor:
Valérie Keller, L. Feigenbaum, P. Blehen, M. Kamal, Ginette Leclercq, Axel Löfberg, Jean-Marc Giraudon, Lucien Leclercq, François Garin, P. Wehrer, P. Delcambe, Paule Kons, Gilbert Maire, L. Binst, Florent Bouillon, Alfred Frennet, Murielle Dufour, M. Cheval, Jean Marie Bastin, Marcelle Jardinier, R. Ducros
Summary In this paper, results of a research work conducted in four laboratories in the frame of the ECC Research Science Program are presented (Contract ST 2J 0467C(TT)). The preparation of bulk tungsten carbide by reaction of WO 3 with a CH 4 /H 2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4667c7642b759fc79f1da0f9a845e5e4
https://doi.org/10.1016/s0167-2991(08)64423-7
https://doi.org/10.1016/s0167-2991(08)64423-7
Publikováno v:
Thin solid films, 143 (1
The structure and surface purity of epitaxial films of rhodium deposited by thermal evaporation and ion sputtering onto MgO(100), air cleaved and chemically polished, and onto epitaxial films of Cu(100) are compared. The orientation (100)d//(100)s (w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::71ffe4cd63b6b733d2e6b9456fe9231e
https://doi.org/10.1016/0040-6090(86)90145-8
https://doi.org/10.1016/0040-6090(86)90145-8
Publikováno v:
Materials Chemistry and Physics. 15:469-474
Single crystal thin films of rhodium are prepared by thermal evaporation of the metal on (100) air cleaved NaCl faces or on epitaxial films of Cu, Ag or Au. (100) rhodium //(100) substrate orientations are always dominant. The epitaxial temperature i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c1d8853cf37f5ee7a29f948e6e9273b
https://doi.org/10.1016/0254-0584(86)90032-5
https://doi.org/10.1016/0254-0584(86)90032-5
Publikováno v:
Thin Solid Films. 170:41-47
The experimental conditions to condense epitaxial films of silver, palladium and Ag-Pd alloys onto (100) air-cleaved rocksalt faces by glow discharge sputtering are described. The orientation (100)d‖(100)s (where d indicates deposit and s substrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::888a165e1206604a4413bd8b52a9c5c9
https://doi.org/10.1016/0040-6090(89)90620-2
https://doi.org/10.1016/0040-6090(89)90620-2
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