Zobrazeno 1 - 10
of 45
pro vyhledávání: '"L Masarotto"'
Publikováno v:
Electronic Imaging. 32:144-1
Autor:
G. Gay, G. Molas, M. Bocquet, E. Jalaguier, M. Gely, L. Masarotto, J. P. Colonna, H. Grampeix, F. Martin, P. Brianceau, V. Vidal, R. Kies, T. Baron, G. Ghibaudo, B. De Salvo
Publikováno v:
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices, Institute of Electrical and Electronics Engineers, 2012, 59 (4), pp.933-940. ⟨10.1109/TED.2012.2182769⟩
IEEE Transactions on Electron Devices, 2012, 59 (4), pp.933-940. ⟨10.1109/TED.2012.2182769⟩
IEEE Transactions on Electron Devices, Institute of Electrical and Electronics Engineers, 2012, 59 (4), pp.933-940. ⟨10.1109/TED.2012.2182769⟩
IEEE Transactions on Electron Devices, 2012, 59 (4), pp.933-940. ⟨10.1109/TED.2012.2182769⟩
In this paper, memory devices integrating a double layer of silicon nanocrystals (Si-ncs) as a trapping medium and a HfAlO-based control dielectrics are presented. We will show that the use of two stacked Si-nc layers significantly improves the memor
Publikováno v:
Thin Solid Films. 518:5382-5386
We have obtained thanks to reduced pressure-chemical vapor deposition germanium nanocrystals in a high quality SiO 2 matrix. A perfect control of (i) the tunnel and control oxide layer thicknesses and (ii) the germanium nanocrystals' density and diam
Publikováno v:
Materials Science Forum. :349-352
In this work, a method to obtain the Shockley-Read-Hall (SRH) minor ity carrier lifetime from the room temperature photoluminescence intensity is proposed. Indeed, taking into ac count the different recombination mechanisms, we calculate the photolum
Publikováno v:
Materials Science and Engineering: B. 102:277-283
An UV scanning photoluminescence (SPL) equipment has been developed in order to study both structural defects at a microscopic scale and the homogeneity of physical properties at the wafer scale in silicon carbide. In one hand, the optical signature
Publikováno v:
Journal of Crystal Growth. 255:8-18
SiGe-based photodetectors operating at 1.3 μm are highly desirable for the development of optical interconnections on SOI substrates. We have therefore investigated the structural and optical properties of high Ge concentration Si/SiGe multi-quantum
Publikováno v:
Scopus-Elsevier
We have adapted a scanning photoluminescence (SPL) apparatus, previously developed for III-V compounds analysis, for the characterization of SiC. The PL mapping is obtained by scanning the sample, fixed to an x - y stage with 1 μ m minimal step, und
Publikováno v:
Materials Science Forum. :601-604
Autor:
Carine Ladner, Laurent Duraffourg, J. Philippe, C. Reita, W. Ludurczak, Vincent Delaye, L. Laurent, A. M. Charvet, Issam Ouerghi, K. Yckache, K. Benedetto, L. Masarotto, Thomas Ernst, P. Scheiblin, A. Testini
Publikováno v:
2014 IEEE International Electron Devices Meeting.
We present for the first time sub-100nm poly-Silicon nanowire (poly-Si NW) based NEMS resonators for low cost cointegrated mass sensors on CMOS featuring excellent performance when compared to crystalline silicon. In particular, comparable quality fa
Autor:
G. Gay, G. Molas, M. Bocquet, E. Jalaguier, M. Gely, L. Masarotto, J. P. Colonna, H. Grampeix, F. Martin, P. Brianceau, V. Vidal, R. Kies, C. Bongiorno, S. Lombardo, T. Baron, G. Ghibaudo, B. De Salvo
Publikováno v:
International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA), Hsin Chu, Taiwan, 2010
info:cnr-pdr/source/autori:Gay G, Molas G, Bocquet M, Jalaguier E, Gely M, Masarotto L, Colonna JP, Grampeix H, Martin F, Brianceau P, Vidal V, Kies R, Bongiorno C, Lombardo S, Baron T, Ghibaudo G, De Salvo B/congresso_nome:International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA)/congresso_luogo:Hsin Chu, Taiwan/congresso_data:2010/anno:2010/pagina_da:/pagina_a:/intervallo_pagine
info:cnr-pdr/source/autori:Gay G, Molas G, Bocquet M, Jalaguier E, Gely M, Masarotto L, Colonna JP, Grampeix H, Martin F, Brianceau P, Vidal V, Kies R, Bongiorno C, Lombardo S, Baron T, Ghibaudo G, De Salvo B/congresso_nome:International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA)/congresso_luogo:Hsin Chu, Taiwan/congresso_data:2010/anno:2010/pagina_da:/pagina_a:/intervallo_pagine
Silicon nanocrystal (Si-nc) trapping layers offer several advantages on standard poly-Si floating gates, as improved data retention after endurance in particular at high temperatures [1][2], robustness toward oxide defects, two-bits per cell storage
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::af10941f5b2a2dbc7f9981705b1cafa5
https://publications.cnr.it/doc/86988
https://publications.cnr.it/doc/86988