Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Kyungwook Lee"'
Publikováno v:
Scientific Reports, Vol 13, Iss 1, Pp 1-10 (2023)
Abstract Navigation in terrains mixture of rigid support and granular media is associated with slippage. It is important to find the optimal path because slippage implies the possibility of a mobile robot being stuck in the sand. This research introd
Externí odkaz:
https://doaj.org/article/f6e49c212e1648c59c396f556f3c2f50
Autor:
Hongjoon Kyong, Myeongjin Choi, Yecheol Moon, Kyungwook Lee, Jongwon Kim, Taegyun Kim, Taewon Seo
Publikováno v:
IEEE Access, Vol 9, Pp 143392-143405 (2021)
This study aimed to optimize the rope winch of a façade-cleaning robot, a system that travels vertically using the friction between ropes and pulleys. However, position errors can be caused by various factors during locomotion. This adversely affect
Externí odkaz:
https://doaj.org/article/c0ff795f22ca44b7bc181a5391a43e40
Publikováno v:
IEEE/ASME Transactions on Mechatronics. :1-8
Publikováno v:
International Journal of Precision Engineering and Manufacturing. 23:1163-1171
Publikováno v:
IEEE Robotics and Automation Letters. 7:1620-1626
Autor:
TaeWon Seo, Taegyun Kim, Myeongjin Choi, Hongjoon Kyong, Kyungwook Lee, JongWon Kim, Yecheol Moon
Publikováno v:
IEEE Access. 9:143392-143405
This study aimed to optimize the rope winch of a facade-cleaning robot, a system that travels vertically using the friction between ropes and pulleys. However, position errors can be caused by various factors during locomotion. This adversely affects
Publikováno v:
Journal of the Korean Society of Propulsion Engineers. 22:152-159
Publikováno v:
Aerospace Science and Technology. 68:362-369
Numerical simulations of a hot gas valve were conducted in this study to establish an analysis method. The far-field effect was also checked to select a computational domain. The existence of the far-field did not affect flow and temperature characte
Publikováno v:
1995 IEEE International SOI Conference Proceedings.
The BOnded Silicon On Insulator (BOSOI) has been considered as a promising substitute for bulk silicon technology because of its structural flexibility. However,there are considerable drawbacks if epitaxial etch stopping or localized plasma etching t
Autor:
Ju-Tae Moon, Kyungwook Lee, Nae-In Lee, Ho-Kyu Kang, Geum-Jong Bae, Tae-Hee Choe, K. Fujihara, Hwa-Sung Rhee, Sang-Su Kim
Publikováno v:
2000 IEEE International SOI Conference. Proceedings (Cat. No.00CH37125).
Fully-depleted silicon-on-insulator (FDSOI) MOSFETs are very attractive for low-voltage applications due to ideal subthreshold slope, short channel effect (SCE) immunity and reduced junction capacitance compared to bulk silicon MOSFETs. However, the