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pro vyhledávání: '"Kyu-Se Choi"'
Autor:
Wonseop Choi, Kyu-Se Choi, Zhan Chen, Seung-Mahn Lee, Rajiv K. Singh, G. Bahar Basim, Brij M. Moudgil
Publikováno v:
MRS Bulletin. 27:752-760
The formulation of slurries for chemical–mechanical planarization (CMP) is currently considered more of an art than a science, due to the lack of understanding of the wafer, slurry, and pad interactions involved. Several factors, including the larg
Autor:
Singh, Rajiv K., Lee, Seung-Mahn, Choi, Kyu-Se, Bahar Basim, G., Choi, Wonseop, Chen, Zhan, Moudgil, Brij M.
Publikováno v:
MRS Bulletin; Oct2002, Vol. 27 Issue 10, p752-760, 9p