Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Kyri Nicolai"'
Autor:
Robert P. Ebeling, Rory de Zanger, F.T. Molkenboer, Michael Dekker, Chien-Ching Wu, Michel van Putten, Jochem Janssen, Herman H. P. Th. Bekman, Arnold Storm, Corné Rijnsent, Joop Meijlink, Norbert B. Koster, Jetske Stortelder, Kyri Nicolai
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and install
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a579e112a4955ccb9c63ece7ac1b0cbf
https://doi.org/10.1117/12.2536531
https://doi.org/10.1117/12.2536531
Autor:
O. Kievit, Veronique de Rooij-Lohmann, Jacqueline van Veldhoven, Herman H. P. Th. Bekman, Rory de Zanger, Michel van Putten, Rik Jonckheere, Alex Deutz, Rob Ebeling, Chien-Ching Wu, Frank Scholze, Jeroen Westerhout, Kyri Nicolai, Markus Bender
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
TNO has built EBL2, an EUV exposure facility equipped with an in vacuo X-ray photoelectron spectroscopy setup (XPS) and an in-situ ellipsometer. EBL2 enables lifetime testing of EUV optics, photomasks, pellicles and related components under developme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd6f09c8cdd9c29fdfb542228c4dc787
https://doi.org/10.1117/12.2537734
https://doi.org/10.1117/12.2537734