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pro vyhledávání: '"Kyoung-yoon Back"'
Autor:
Han-Ku Cho, Sung-Woo Lee, Young-Chang Kim, Kyoung-yoon Back, Suk-Joo Lee, Sungsoo Suh, Sang-Wook Kim
Publikováno v:
Microelectronic Engineering. 84:755-760
Use of off-axis illumination such as dipole and cross-pole to obtain minimum dense pitch resolution limits process margin due to side lobe defect pattern formation. Side lobe or ghost images are unwanted additional patterns formed at wafer image at c
Autor:
Kyoung-yoon Back, Sook Lee, Sang-Wook Kim, Suk-Joo Lee, Yong-Jin Chun, Sungsoo Suh, Young-Chang Kim
Publikováno v:
SPIE Proceedings.
In order to perform an optical proximity correction of memory device nodes below half-pitch 50nm, so called 3D mask effects need to be included in a model based OPC. As the mask pitch approaches wavelength of an optical system, and the angle of off-a