Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Kwei−tin Yeh"'
Publikováno v:
Journal of the Chinese Chemical Society. 64:1048-1057
The time-lag problem is treated for absorptive penetration across a heterogeneous membrane, where both the diffusivity D(x) and the partition coefficient K(x) depend on the coordinate x (0 ≦ x ≦ h), with 0 and h being the coordinates of the upstr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4a90659074cb93d67a3d258326787e4
https://doi.org/10.1002/jccs.201700118
https://doi.org/10.1002/jccs.201700118
Publikováno v:
Journal of the Chinese Chemical Society. 64:1156-1163
The monomer–dimer self-association of the dilute 3-ethyl-2-methyl-3-pentanol in tetrachloroethylene in the very dilute state was studied by infrared spectroscopy at several temperatures. The solute was deliberately chosen so that higher oligomers w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ae0a95366e397141848b4c6d36e0c361
https://doi.org/10.1002/jccs.201600865
https://doi.org/10.1002/jccs.201600865
Publikováno v:
Journal of the Chinese Chemical Society. 61:867-874
Siegel’s analysis on membrane transport in the Laplace domain [J. Phys. Chem. 95 (1991) 2556] in terms of transmission matrix, T(s), has been extended to a more useful formulation. This is achieved by combining uses of the matrix transport equation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f8278711234d30114bb34cddcd93ca9
https://doi.org/10.1002/jccs.201300491
https://doi.org/10.1002/jccs.201300491
Publikováno v:
Journal of Solution Chemistry. 42:2269-2280
The monomer–dimer self-association equilibrium of 2,2-dimethyl-3-ethyl-3-pentanol in n-octane has been studied by IR spectroscopy at four temperatures (288, 298, 308, and 318 K). The solute was chosen to restrict the self-association between solute
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::277039dc95b35b918469ef65ac106206
https://doi.org/10.1007/s10953-013-0114-7
https://doi.org/10.1007/s10953-013-0114-7
Publikováno v:
Japanese Journal of Applied Physics. 46:105-110
The applications of a high-transmittance embedded layer (HTEL) (T=15–35%) in an attenuated phase-shifting mask were studied by simulation with the aid of Taguchi design of experiment. A modified transmittance control mask with HTEL was proven to be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bad7571a5622d04312f790a0a3ba88aa
https://doi.org/10.1143/jjap.46.105
https://doi.org/10.1143/jjap.46.105
Publikováno v:
Japanese Journal of Applied Physics. 45:6216-6224
Simulations for the optimization of the mask error enhancement factor (MEEF) by using Taguchi's design of experiment (DOE) method in both dry and immersion ArF lithography have been demonstrated here. By DOE, MEEF has been successfully reduced, and t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bcccc5ca3756f462c47df2e1593f89a
https://doi.org/10.1143/jjap.45.6216
https://doi.org/10.1143/jjap.45.6216
Autor:
Kwei-Tin Yeh, Wen-an Loong
Publikováno v:
Japanese Journal of Applied Physics. 45:2481-2496
In general, better resolution and lower mask error enhancement factor (MEEF) are obtained when a higher numerical aperture (NA) is used. However, simulations in this study show that, if Y-polarized light and off-axis illuminations were used, higher N
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6bfba69ba6bd49256f9da44e961b4989
https://doi.org/10.1143/jjap.45.2481
https://doi.org/10.1143/jjap.45.2481
Publikováno v:
Japanese Journal of Applied Physics. 45:1566-1569
Because the surface roughness of a thin film will cause light scattering, the reflectance (R) and transmittance (T) measured using a UV/visible (vis) spectrometer become lower than the actual values. The deviation becomes larger with increasing rough
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a5729f915d0c4288898529ec54e5156
https://doi.org/10.1143/jjap.45.1566
https://doi.org/10.1143/jjap.45.1566
Autor:
Chao-Yi Huang, Kwei-Tin Yeh
Publikováno v:
SPIE Proceedings.
For 193 nm immersion lithography, it is hard to print clear 4X nm dense images (ex. contact holes) on wafer without any modifications due to lower light intensity. In the past, the most common method is to add the scattering bars, which can enhance t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba62e48a4e6d975a7a613690a297c025
https://doi.org/10.1117/12.2065207
https://doi.org/10.1117/12.2065207