Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Kwang Hyuk Ko"'
Autor:
Chung Gon Yoo, Hyoun Woo Kim, Sang Don Choi, Kwang Hyuk Ko, Je Ho Woo, Chang Jin Kang, J. G. Lee, Nam Ho Kim, Han Sup Lee, Chin-Wook Chung, Dae Kyu Choi, Ju Hyun Myung, Se-Geun Park, Wan Jae Park
Publikováno v:
Thin Solid Films. :222-224
We have studied the characteristics of photoresist (PR) ashing using N 2 /O 2 plasmas in ferrite-core inductively coupled plasma etcher. By varying the O 2 /(O 2 + N 2 ) gas flow ratio, we have changed the PR ash rate and the low-k material etch rate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b33725648ef59152cd418d11df26eff1
https://doi.org/10.1016/j.tsf.2005.08.089
https://doi.org/10.1016/j.tsf.2005.08.089
