Stage tracking of a mask-scan EB mask writer test stand.

Autor: Nishimura, Shinsuke, Mitsui, Soichiro, Ogasawara, Munehiro, Akeno, Kiminobu, Shimizu, Mitsuko, Kusakabe, Hideo, Wada, Hirotsugu, Hattori, Kiyoshi, Yoshitake, Shusuke, Shimomura, Naoharu, Takamatsu, Jun, Sunaoshi, Hitoshi, Fukudome, Yuuji, Tojo, Toru, Tsuchiya, Seiichi

Publikováno v: Proceedings of SPIE; Nov2002, Issue 1, p503-510, 8p

Development of a mask-scan electron beam mask writer.

Autor: Nishimura, Shinsuke, Shimizu, Mitsuko, Mitsui, Soichiro, Akeno, Kiminobu, Kusakabe, Hideo, Ogasawara, Munehiro, Hayashi, Ryuji, Yanaga, Shinji, Kobayashi, Noboru, Tojo, Toru

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2002, Vol. 20 Issue 6, p2640-2645, 6p

Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation

Autor: Hattori, Kiyoshi, Ikenaga, Osamu, Tamamushi, Syuichi, Wada, Hirotsugu, Nishimura, Eiji, Ikeda, Naotaka, Katoh, Yoshihide, Kusakabe, Hideo, Yoshikawa, Ryoichi, Takigawa, Tadahiro

Publikováno v: Japanese Journal of Applied Physics; October 1989, Vol. 28 Issue: 10 p2065-2065, 1p