Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kurtis C. Fairley"'
Autor:
Devin R. Merrill, Gregory S. Herman, Keenan N. Woods, Darren W. Johnson, David W. Johnson, Richard P. Oleksak, Can Xu, Jeffrey Ditto, Kurtis C. Fairley, Eric Garfunkel, Catherine J. Page, Torgny Gustafsson
Publikováno v:
ACS applied materialsinterfaces. 8(1)
A variety of metal oxide films (InGaOx, AlOx, “HafSOx”) prepared from aqueous solutions were found to have non-uniform electron density profiles using X-ray reflectivity. The inhomogeneity in HafSOx films (Hf(OH)4–2x−2y(O2)x(SO4)y·zH2O), whi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32084568c4d5d248a8a1bfe07c93b695
https://pubmed.ncbi.nlm.nih.gov/26671578
https://pubmed.ncbi.nlm.nih.gov/26671578
Autor:
Timothy E. Robitshek, Darren W. Johnson, Michelle M. Watt, Michael M. Haley, Kurtis C. Fairley, Jeffrey M. Engle
Publikováno v:
Organicbiomolecular chemistry. 13(14)
Receptors selective for anions in aqueous media are a crucial component in the detection of anions for biological and environmental applications. Recent sensor designs have taken advantage of systems known to aggregate in solution, eliciting a fluore
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a5a48ce85c301251c9d6d32428811fcc
https://pubmed.ncbi.nlm.nih.gov/25758666
https://pubmed.ncbi.nlm.nih.gov/25758666
Autor:
Feixiang Luo, Eric Garfunkel, Rose E. Ruther, Richard P. Oleksak, Gregory S. Herman, William F. Stickle, Darren W. Johnson, Douglas A. Keszler, Kurtis C. Fairley, Shawn R. Decker
Publikováno v:
ACS applied materialsinterfaces. 6(4)
High-resolution transmission electron microscopy (TEM) imaging and energy-dispersive X-ray spectroscopy (EDS) chemical mapping have been used to examine key processing steps that enable sub-20-nm lithographic patterning of the material Hf(OH)4-2x-2y(
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5c3dab8fc9813e46a281c59e88692836
https://pubmed.ncbi.nlm.nih.gov/24502280
https://pubmed.ncbi.nlm.nih.gov/24502280
Autor:
David W. Johnson, Gavin Mitchson, Darren W. Johnson, Meredith C. Sharps, Jeffrey Ditto, Kurtis C. Fairley
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34:041607
Reducing the accelerating voltage used to pattern a high-resolution inorganic thin film electron beam resist, HafSOx dramatically decreases the dose required to pattern sub-10 nm lines. Ellipsometry measurements of dose curves created for HafSOx show
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78d8bcdf9be642e9f7aaec223295da77
https://doi.org/10.1116/1.4954394
https://doi.org/10.1116/1.4954394