Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Kuriyama, Toshihiro"'
Autor:
Susa, Masahiro, Hiroshima, Yoshimitsu, Senda, Kohji, Kuriyama, Toshihiro, Matsumoto, Shigenori, Terakawa, Sumio, Takamura, Tohru
Publikováno v:
Journal of Applied Physics; 11/15/1985, Vol. 58 Issue 10, p3880, 4p, 2 Black and White Photographs, 2 Diagrams, 3 Graphs
Autor:
Saito, Masamichi, Hasegawa, Naoya, Tanaka, Kenichi, Ide, Yosuke, Koike, Fumihito, Kuriyama, Toshihiro
Publikováno v:
Journal of Applied Physics; 5/1/2000, Vol. 87 Issue 9, p6974, 3p
Autor:
Kuriyama Toshihiro, Yoshikazu Sano, Hirotatu Kodama, Yoshimitsu Hiroshima, Masanori Ohmae, Takumi Yamaguchi, Masaji Asaumi, Tsutomu Imanishi, Shin-ichi Tashiro
Publikováno v:
The Journal of the Institute of Television Engineers of Japan. 49:182-187
A 1/4-inch format 560 k pixel IT-CCD image sensor was developed with a high-resolution electronic image stabilizing system that uses a driving method and novel process technology. The new pixel design, process, and on-chip color filter technology kee
Publikováno v:
Journal of Applied Physics. 85:4928-4930
Spin valve films with the PtMn/Co/Ru/Co synthetic ferrimagnet pinned layer, in which the magnetization of the two Co layers is strongly coupled in an antiparallel orientation and the magnetization direction of one of the Co layers is pinned by unidir
Autor:
Sumio Terakawa, Masahiro Susa, Tohru Takamura, Matsumoto Shigenori, Kuriyama Toshihiro, Yoshimitsu Hiroshima, Kohji Senda
Publikováno v:
Journal of Applied Physics. 58:3880-3883
A new fabrication process for solid‐state imagers based on the borophosphosilicate glass (BPSG) flow has been developed. It was found that well‐designed tapered steps can be obtained even at low temperatures with the use of BPSG, which can be cle
Fixed pattern noise in the solid‐state imagers due to the striations in Czochralski silicon crystals
Autor:
T. Kunii, Masahiro Susa, Yoshimitsu Hiroshima, Kuriyama Toshihiro, Sumio Terakawa, Matsumoto Shigenori, Kohji Senda
Publikováno v:
Journal of Applied Physics. 57:1369-1372
The concentric circle pattern of growth striations in Czochralski (CZ) silicon wafer has been found to cause the fixed pattern noise in the reproduced image by solid‐state imagers with the p‐well structure. The microgrowth striations of dopant im
Publikováno v:
Electronics and Communications in Japan (Part I: Communications). 67:100-107
The performance of CCD image sensors is strongly influenced by the crystal quality of the silicon wafer because it is an analog VLSI device which measures optical signals. In order to examine the relation between the imaging characteristics of the se
Autor:
Kuriyama Toshihiro, Takao Kunii, Yoshimitsu Hiroshima Yoshiaki Sone, Kenju Horii, Takao Kuroda
Publikováno v:
Extended Abstracts of the1983 Conference on Solid State Devices and Materials.
Autor:
Takao Kuroda, Kuriyama Toshihiro, Takao Kunii, Yoshimitsu Hiroshima, Kenju Horii, Matsumoto Shigenori
Publikováno v:
The Journal of the Institute of Television Engineers of Japan. 37:788-794_1
CCD固体撮像素子について, 2/3インチサイズ素子の設計・プロセス技術で, より小形の1/2インチサイズ素子, および8mmサイズ素子を製作した場合の予想特性を求めた.予想特性を求める方法と
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