Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Kuo-Ting Chu"'
Autor:
Kuo-Ting Chu, 朱國廷
100
Synthesis of one-dimensional (1-D) zinc oxide nanostructures (ZnO) based on vapor-solid (V-S) mechanism by chemical vapor deposition (CVD) method usually utilize low active metal catalysts, such us gold (Au), platinum (Pt) and silver (Ag). I
Synthesis of one-dimensional (1-D) zinc oxide nanostructures (ZnO) based on vapor-solid (V-S) mechanism by chemical vapor deposition (CVD) method usually utilize low active metal catalysts, such us gold (Au), platinum (Pt) and silver (Ag). I
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/19044187676724816955
Publikováno v:
2020 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia).
SiC MOSFET is one of the most popular power devices in some high-end applications. Since SiC MOSFET has already penetrated into many applications, the requirement of accurate SPICE models is a significant issue for circuit designers. From previous li
Autor:
Chih-Fang Huang, Chien-Chung Hung, Jheng-Yi Jiang, Chwan-Ying Lee, Lurng-Shehng Lee, Der-Sheng Chao, Fu-Jen Hsu, Wen-Bin Yeh, Kuo-Ting Chu
Publikováno v:
2020 32nd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
Currently, Schottky diode embedded SiC MOSFETs is a popular topic because of its remarkable intrinsic diode behavior and bipolar-degradation-free operation. JMOS is one of them that exhibits much higher chip area efficiency, which means there is neit
Autor:
Fu-Jen Hsu, Kuo-Ting Chu, Lumg-Shehng Lee, Jheng-Yi Jiang, Chwan-Ying Lee, Chih-Fang Huang, Chien-Chung Hung
Publikováno v:
2020 32nd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
In order to prevent bipolar degradation and improve the performance of body diode in SiC MOSFET, JBS embedded SiC MOSFET technology is attracting researchers’ attention. In this paper, the discussion focuses on JMOS, where the major feature is reta
Publikováno v:
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD).
An integrated back-to-back SiC Zener diode is proposed and designed as an asymmetric bidirectional voltage clamp between the gate and source to protect the gate oxide of SiC MOSFET from the overvoltage stress. The leakage current of integrated SiC Ze
Publikováno v:
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD).
To prevent the degradation caused by Bessel plane dislocation and improve the characteristics of body diode in silicon carbide MOSFETs, Schottky barrier diode integrated MOSFET has been developed by many researchers. One of those structures was named
Autor:
Kuo-Ting Chu, Cheng-Tyng Yen, Lurng-Shehng Lee, Fu-Jen Hsu, Chien-Chung Hung, Chwan-Ying Lee, Ya-Fang Li
Publikováno v:
2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD).
This paper provides a method to match characteristics of SiC MOSFET by a simple SPICE model. Besides, this method not only reaches highly approximate results in an accuracy of characteristics compared to commercial SiC SPICE model but also reduces lo
Autor:
Chien-Chung Hung, Lurng-Shehng Lee, Chwan-Ying Lee, Kuo-Ting Chu, Cheng-Tyng Yen, Ya-Fang Li, Fu-Jen Hsu
Publikováno v:
2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD).
A process and a scalable structure were used to implement the SiC MOSFET with integrated junction barrier controlled Schottky diode (JMOS) without area penalty. The JMOS could provide similar on-resistance and drain-source breakdown voltage with the
Autor:
Der-Sheng Chao, Hua-Yu Shih, Kuo-Ting Chu, Cheng-Tyng Yen, Chih-Fang Huang, Fu-Jen Hsu, Ching-Shun Ku, Lurng-Sheng Lee, Chien-Chung Hung, Jheng-Yi Jiang, Chwan-Ying Lee, Ching-Yu Chiang
Publikováno v:
Japanese Journal of Applied Physics. 58:SBBD08
Publikováno v:
Surface and Coatings Technology. 231:289-292
Zinc oxide/zinc tungstate (ZnO/ZnWO 4 ) nanorods were synthesized as composite nanostructure on the tungsten/glass substrates by thermal oxidation technique for field emission cathodes. The ZnWO 4 wolframite structure in the ZnO film formed the ZnO/Z