Zobrazeno 1 - 2
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pro vyhledávání: '"Kuo-Pei Lu"'
Autor:
Ke-Ying Su, Te-Yu Liu, Chung-Kai Lin, King-Ho Tam, Min-Chie Jeng, Cheng Tai-Yu, Kevin Chen, Cheng Hsiao, Jun-Fu Huang, Ke-Wei Su, Kuo-Pei Lu, Joshua Sun, Chun Cheng, Katherine Chiang
Publikováno v:
2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
A comprehensive variation model is critical to achieve both competitive design and manufacturing yield in advanced technologies. Conventionally, as long as FEOL (front end of line) statistical model is appropriate, BEOL (back end of line) variations
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9a23615575616050edd1fbdf7803ccb
https://doi.org/10.1109/sispad.2016.7605208
https://doi.org/10.1109/sispad.2016.7605208
