Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Kunio Ueta"'
Publikováno v:
Pattern Recognition. 39:1044-1052
A method to detect mura, which is defined as an irregular lightness variation on a uniformly manufactured surface, is necessary to maintain the quality of the display devices. The mura is understood as defects without a clear contour or a contrast wh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfedd787c2d78b6b0f0df0f00e2d4dc5
https://doi.org/10.1016/j.patcog.2005.07.007
https://doi.org/10.1016/j.patcog.2005.07.007
Publikováno v:
IEEJ Transactions on Industry Applications. 126:1539-1548
A method to detect MURA, which is defined as irregular lightness variation on uniformly manufactured surface, is necessary to keep quality of the display devices. The MURA is inevitable matter for devices relating to image processing. Input devices,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62defb045adeca4e73fd52328b5f2921
https://doi.org/10.1541/ieejias.126.1539
https://doi.org/10.1541/ieejias.126.1539
Publikováno v:
Eighth International Conference on Quality Control by Artificial Vision.
A mura quantification method in the mura inspection is reported. Mura is local unevenness of lightness in a uniformly manufactured surface without clear contour which gives viewers unpleasant sensation. The mura has been inspected by human inspectors
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a796c5a96775c8e3f7c9f61c536ff5be
https://doi.org/10.1117/12.736735
https://doi.org/10.1117/12.736735
Publikováno v:
SMC
Here, we describe a method to detect mura during the display devices manufacturing process on a uniformly coated thin photoresist layer. A mura is an irregular variation of lightness on a uniformly manufactured surface. Display devices are manufactur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::591d2c8ff3056621914ce8a2e1520be3
https://doi.org/10.1109/icsmc.2006.385108
https://doi.org/10.1109/icsmc.2006.385108
Autor:
Kunio Ueta, Hirokimi Shirasaki
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
This paper shows the basic numerical calculation methods for measuring linewidths between 45-80nm using normal and oblique incident lightwaves to control the resist and silicon linewidths for the next-generation semiconductor circuits. The shape meas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd490c98b46fe6f88a42eac4cc4b9a13
https://doi.org/10.1117/12.533571
https://doi.org/10.1117/12.533571
Publikováno v:
SPIE Proceedings.
This paper obtains basic numerical data fro measuring linewidths using light waves to contorl the sub-100nm resist and silicon linewidth. We use the finite-difference time-domain (FDTD) method as the numerical analysis method, becuase the method can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23622471df9f1312b0cfd0adaf1aff53
https://doi.org/10.1117/12.482643
https://doi.org/10.1117/12.482643
Publikováno v:
SID Symposium Digest of Technical Papers. 37:1774
A method to detect mura on a coated photoresist layer in the manufacturing line of display devices is reported. The mura is irregular nonuniformity of transmittance or reflectance on a uniformly manufactured surface. The display devices are manufactu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b79ca73243c700824fa213b9124131e
https://doi.org/10.1889/1.2433381
https://doi.org/10.1889/1.2433381