Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Kuninori Nishizawa"'
Publikováno v:
SPIE Proceedings.
Pattern matching seems to be promising technique to the mask industry. It can be used for many applications such as hot spot detection of post-OPC data, search of AIMS reference location or CDSEM measurement point extraction. In particular, fuzzy pat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4514b0176f289d44f4beadf4fb374298
https://doi.org/10.1117/12.2027851
https://doi.org/10.1117/12.2027851
Publikováno v:
SPIE Proceedings.
Since the layout patterns on photomasks have been getting more and more complicated by OPC/RET processes, the mask patterns need to go through the verification to check the mask manufacturability even though the layout is 'DRC clean'. This verificati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b79060ab1f2c0362f2da0e536d01c3ba
https://doi.org/10.1117/12.970256
https://doi.org/10.1117/12.970256
Autor:
Toshiaki Fujii, Tadao Inoue, Kuninori Nishizawa, Masakazu Endo, Yoshiyuki Taniguchi, Kokoro Kato
Publikováno v:
SPIE Proceedings.
In order to go through the transition term from GDSII to OASIS successfully, the aid of the verification tools between OASIS and GDSII is necessary. In general, we have two methods of OASIS file verification. One is a hierarchical method that checks
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cda883f7661e7bee7a5ea57d1458ea97
https://doi.org/10.1117/12.793111
https://doi.org/10.1117/12.793111
Publikováno v:
SPIE Proceedings.
The OASIS (Open Artwork System Interchange Standard) format is a new standard format for describing LSI layout data and it has begun to be used for photomask data. One of the greatest features of OASIS format is its conciseness of expressing pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9e4a378e64156f58c267537caebc0c0
https://doi.org/10.1117/12.729008
https://doi.org/10.1117/12.729008
Publikováno v:
SPIE Proceedings.
OASIS format has begun to be accepted in the field of mask data processing gradually. Major EDA venders have announced their support of OASIS format and new versions of EDA tools which can handle with OASIS files have been shipped one by one. Still,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7df392c7a87dea516bbbe147ed7fd7b
https://doi.org/10.1117/12.681802
https://doi.org/10.1117/12.681802
Autor:
Shogo Narukawa, Toshio Suzuki, Koki Kuriyama, Naoya Hayashi, Tadao Inoue, Kuninori Nishizawa, Kokoro Kato
Publikováno v:
SPIE Proceedings.
As patterns on photomasks are getting more complex due to RET technologies, mask rule check (MRC) has become an essential process before manufacturing photomasks. Design rule check (DRC) tools in the EDA field can be applied for MRC. However, photoma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::acb13f95b9269829879b36f681617cfe
https://doi.org/10.1117/12.681848
https://doi.org/10.1117/12.681848
Publikováno v:
SPIE Proceedings.
We have been developing intellectual properties (IP) protection software using OASIS format. In the Photomask Technology 2004 we presented that by taking advantage of repetition presentation of OASIS, it becomes possible to express arrayed patterns w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a227e07d547dc93eae0715d0b28b1969
https://doi.org/10.1117/12.617152
https://doi.org/10.1117/12.617152
Publikováno v:
SPIE Proceedings.
In this paper we present new development of intellectual properties(IP) protection software using OASIS format. By taking advantage of repetition presentation of OASIS, it becomes possible to express arrayed patterns without any generation of new cel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab7b994f7e96a044ed54b0e6f9169df4
https://doi.org/10.1117/12.577807
https://doi.org/10.1117/12.577807
Publikováno v:
SPIE Proceedings.
The contact layer has been said to be the first application of NGL technologies such as EPL or LEEPL, in which stencil masks are used. Since the computation time depends on the number of edges of patterns, contact layer data which contains many recta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b989c4e645b5b0e62c41219fe8d9ab22
https://doi.org/10.1117/12.557780
https://doi.org/10.1117/12.557780
Publikováno v:
SPIE Proceedings.
EPLON is the name of a system that we have been developing as a data conversion system for EPL masks in order to meet the requirements of EPL stencil masks. In our paper we presented in PMJ2002, we proved that our system could convert the whole chip
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6527e30f56dd1b3fcfeda26edcc430d
https://doi.org/10.1117/12.504245
https://doi.org/10.1117/12.504245