Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Kunihiko Ueno"'
Publikováno v:
SPIE Proceedings.
Lithography will use various types of resolution enhancement technique on reticles such as EAPSM and OPC to extend refractive reduction optics to the 130 nm node and below. And there are mountainous difficulties that confront mask- makers as well as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fa238a8161cd77e804ae32e94955d556
https://doi.org/10.1117/12.425091
https://doi.org/10.1117/12.425091
Publikováno v:
SPIE Proceedings.
Improving microprocessor speed, design and density are mainly determined by the minimum feature size that can be imaged on the wafer [1]. On the other hand, the latter is limited by the optics, the lithographic wavelength and the process used. Phase
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::654e4b1a1a7051a337ca09646dd14014
https://doi.org/10.1117/12.410762
https://doi.org/10.1117/12.410762