Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Kunihiko KOIKE"'
Publikováno v:
International Journal of Chemical Engineering, Vol 2012 (2012)
We have been developing a new dry-type off-gas treatment system for recycling fluorine from perfluoro compounds present in off-gases from the semiconductor industry. The feature of this system is to adsorb the fluorine compounds in the exhaust gases
Externí odkaz:
https://doaj.org/article/9594c1f03cca4d5ab63806db35587838
Autor:
Yasuhiro IKEDA, Satomi MUROYA, Kazutaka SATOU, Goichi INOUE, Kunihiko KOIKE, Tsuyoshi MAEKAWA
Publikováno v:
Yamaguchi Medical Journal. 70:109-118
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf2a951413bda638e49cacbb0d1b8c90
https://doi.org/10.2342/ymj.70.109
https://doi.org/10.2342/ymj.70.109
Decomposition of N2O Gas by Non-thermal Equilibrium Plasma using Activated Carbon Packed Bed Reactor
Publikováno v:
IEEJ Transactions on Fundamentals and Materials. 139:24-29
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::032510bd1a91c0d3ba1b7d024fc802ae
https://doi.org/10.1541/ieejfms.139.24
https://doi.org/10.1541/ieejfms.139.24
Publikováno v:
Japanese Journal of Applied Physics. 61:SI1007
The reactive gas cluster injection process is an etching method that uses a neutral cluster beam without plasma. This process can avoid damage caused by energetic ion irradiation and vacuum UV light from the plasma. The characteristics of an etching
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bec4e787845ecf89637b4e3ef573e9c8
https://doi.org/10.35848/1347-4065/ac6565
https://doi.org/10.35848/1347-4065/ac6565
Autor:
Kunihiko Koike, Takashi Nishiyama, Masayoshi Takahashi, Masashi Yamamoto, Eriko Sato, Hideo Horibe, Kohei Matsuura, Tomosumi Kamimura
Publikováno v:
Journal of Photopolymer Science and Technology. 29:623-627
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9734abfcba2d1d276dd5266a8cfe946d
https://doi.org/10.2494/photopolymer.29.623
https://doi.org/10.2494/photopolymer.29.623
Publikováno v:
Microelectronic Engineering. 141:145-149
Display Omitted We succeeded in achieving features with high-aspect-patterns, which is 60nm line width on a 180nm pitch.ClF3-Ar neutral cluster beam was capable of high-aspect-ratio etching in feature sizes of less than 100nm.This etching method may
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d905b4fdeb20040eab26ac44c8f14ae
https://doi.org/10.1016/j.mee.2015.03.006
https://doi.org/10.1016/j.mee.2015.03.006
Autor:
Masayoshi Takahashi, Kunihiko Koike, Hideo Horibe, Takashi Nishiyama, Eriko Sato, Masashi Yamamoto, Kohei Matsuura
Publikováno v:
Journal of Photopolymer Science and Technology. 28:299-301
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6a3c46d7328741a567d053ddce26cc4
https://doi.org/10.2494/photopolymer.28.299
https://doi.org/10.2494/photopolymer.28.299
Publikováno v:
KAGAKU KOGAKU RONBUNSHU. 39:452-457
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ff9de9232a83cb850e8454591456185
https://doi.org/10.1252/kakoronbunshu.39.452
https://doi.org/10.1252/kakoronbunshu.39.452
Publikováno v:
KOBUNSHI RONBUNSHU. 70:295-299
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92ba4ff30b3c13afb50aa5158155d377
https://doi.org/10.1295/koron.70.295
https://doi.org/10.1295/koron.70.295
Autor:
Nishiyama Itsuo, Kunihiko Koike, Seiji Takahashi, Hideo Horibe, Ritsu Kamoto, Akihiko Kono, Yukihiro Angata, Yousuke Goto
Publikováno v:
KAGAKU KOGAKU RONBUNSHU. 39:144-149
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc57677e242b13e5a45ecdf6ef0ba60e
https://doi.org/10.1252/kakoronbunshu.39.144
https://doi.org/10.1252/kakoronbunshu.39.144