Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Kuniaki Yamazaki"'
Autor:
Ya-Huei Erica Chang, Dih-Yang Andy Kuo, Jhih Wei Gwako Liang, Kuniaki Yamazaki, Jay Zhang, Hitoshi Sakoda, Norio Kamitsubo
Publikováno v:
2022 17th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT).
Autor:
Toshiyuki Hattori, Minoru Yanokura, Michi Aratani, Hideshi Muto, Masahero Okamura, Yasuyuki Ishii, Kuniaki Yamazaki, Toyohiko Yano, Fumihero Hirata, Michihiro Oyaizu, Yohsuke Takahashi, Katsunori Kawasaki, Isao Sugai
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 320:15-21
A heavy noble gas ion beam sputtering (HIBS) technique was developed to prepare carbon stripper foils with a characteristic of long lifetime. The dependence of lifetimes on the mass of noble gas was also investigated. Compared with foils made by ligh
Autor:
Hideshi Muto, Toshiyuki Hattori, Katsunori Kawasaki, Isao Sugai, Michihiro Oyaizu, Kuniaki Yamazaki, Toyohiko Yano, Yohsuke Takahashi
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 303:59-62
Nitrided carbon stripper foils with excellent lifetimes and mechanical properties have been made by a new method based on reactive nitrogen-ion-beam sputtering. The foils showed no shrinkage and maintained mechanical flexibility during long periods o
Publikováno v:
SPIE Proceedings.
We propose a novel alignment method using scattered-light, which has high sensitivity to a silicon carbide x-ray mask without coating antireflection films and opaque film. The scattered-light alignment system is a video-based alignment utilizing the
Publikováno v:
SPIE Proceedings.
The Center for X-ray Lithography (CXrL) has developed an x-ray mask fabrication process based on silicon nitride membranes and gold absorber. The LPCVD conditions for the growth of the nitride film produce 2 micrometers thick films with low tensile s
Autor:
Kuniaki Yamazaki, Franco Cerrina, Richard K. Cole, Paul D. Anderson, G. M. Wells, E. L. Brodsky
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II.
We report the first results on the performance of the new beamlines installed at CXrL. Three new lines have become operational in 1991, bringing the total of ports in use at the Center to five. The High-Flux beamline (Exposure Station #2) was commiss
Autor:
Kuniaki Yamazaki, Ryousei Murakami
Publikováno v:
Proceedings of the International Symposium on Automation and Robotics in Construction (IAARC).
Publikováno v:
Japanese Journal of Applied Physics. 37:6813
The degradation of overlay accuracy due to metallization (i.e., aluminum copper physical vapor deposition (PVD) process) on electronics devices is reported. In a video-based scattered-light alignment (SLA) system for X-ray lithography, the metal laye
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3471
Previously we described a video-based scattered-light alignment (SLA) system, capable of nanometer-scale alignment accuracy. In order to meet highly accurate alignment with low optical transparency in x-ray masks, we performed the modifications of al
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2471
The alignment performances of the video-based scattered-light alignment (SLA) system for 0.1 μm lithography are described in this article. The SLA system has high sensitivity to the silicon carbide (SiC) mask without an antireflection coating (ARC).