Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Kunaljeet Tanwar"'
Autor:
Christopher J. Waskiewicz, Raghuveer R. Patlolla, Kunaljeet Tanwar, Wei-Tsu Tseng, Christopher J. Penny, Michael F. Lofaro, Donald F. Canaperi
Publikováno v:
Journal of The Electrochemical Society. 160:D3247-D3254
Surface structure of magnetite (111) under hydrated conditions by crystal truncation rod diffraction
Publikováno v:
Surface Science. 604:1082-1093
X-ray crystal truncation rod (CTR) diffraction under hydrated conditions at circum-neutral pH was used to determine the surface structure of Fe3O4(111) following a wet chemical mechanical polishing (CMP) preparation method. The best-fit model to the
Publikováno v:
Geochimica et Cosmochimica Acta. 73:4346-4365
The surface structure of {alpha}-Fe{sub 2}O{sub 3}(0 0 0 1) was studied using crystal truncation rod (CTR) X-ray diffraction before and after reaction with aqueous Fe(II) at pH 5. The CTR results show the unreacted {alpha}-Fe{sub 2}O{sub 3}(0 0 0 1)
Publikováno v:
The Journal of Physical Chemistry C. 113:2159-2170
The persistence of lead (Pb) in contaminated topsoil is ranked as one of the most serious environmental issues in the U.S. and other countries. Adsorption of Pb at the aqueous interface of nanoscale metal oxide and metal (oxy)hydroxide particles is p
Publikováno v:
Geochimica et Cosmochimica Acta. 72:3311-3325
The structure of α - Fe 2 O 3 ( 1 1 ¯ 02 ) reacted with Fe(II) under anoxic conditions was studied using crystal truncation rod (CTR) diffraction. The CTR results show the crystalline termination of α - Fe 2 O 3 ( 1 1 ¯ 02 ) is modified due to ad
Autor:
Peter J. Eng, Jeffrey G. Catalano, Sanjit Ghose, Sarah C. Petitto, Kunaljeet Tanwar, Thomas P. Trainor
Publikováno v:
Surface Science. 601:L59-L64
The surface structure of α- Fe 2 O 3 ( 1 1 ¯ 0 2 ) was studied under two different surface preparation conditions using crystal truncation rod (CTR) diffraction. Wet chemical and mechanical polishing (CMP) at 298 K results in a crystalline surface
Autor:
Gordon E. Brown, Glenn A. Waychunas, Kunaljeet Tanwar, Cynthia S. Lo, Anne M. Chaka, Donald A. Walko, Jeffrey G. Catalano, Thomas P. Trainor, Peter J. Eng
Publikováno v:
Surface Science. 601:460-474
The structure of the hydroxylated a-Fe2O3ð1 102 Þ surface prepared via a wet chemical and mechanical polishing (CMP) procedure was determined using X-ray crystal truncation rod diffraction. The experimentally determined surface model was compared w
Autor:
James J. Kelly, Terry A. Spooner, C.-K. Hu, X. Zhang, Motoyama Koichi, A. Simon, Raghuveer R. Patlolla, Oscar van der Straten, Hosadurga Shobha, Ming He, James Chingwei Li, Timothy M. Shaw, Kunaljeet Tanwar, Daniel C. Edelstein, Takeshi Nogami, Stephan A. Cohen, Moosung M. Chae, Elbert E. Huang, X. Lin, Griselda Bonilla, S. H. Chen, Christopher J. Penny
Publikováno v:
IEEE International Interconnect Technology Conference.
In order to maximize Cu volume and reduce via resistance, barrier thickness reduction is a strong option. Alternative barriers for next-generation BEOL were evaluated in terms of barrier performance to O 2 and Cu diffusion, and effects on reliability
Autor:
X. Zhang, Hosadurga Shobha, C. Parks, Ming He, X. Lin, Donald F. Canaperi, A. Simon, Anita Madan, James Chingwei Li, Raghuveer R. Patlolla, Kunaljeet Tanwar, Daniel C. Edelstein, J. Maniscalco, Oscar van der Straten, Philip L. Flaitz, Mahadevaiyer Krishnan, Christopher J. Penny, James J. Kelly, David L. Rath, Chenming Hu, Terry A. Spooner, Takeshi Nogami, Tibor Bolom
Publikováno v:
2013 IEEE International Interconnect Technology Conference - IITC.
In studying integrated dual damascene hardware at 10 nm node dimensions, we identified the mechanism for Co liner enhancement of Cu gap-fill to be a wetting improvement of the PVD Cu seed, rather than a local nucleation enhancement for Cu plating. We
Autor:
Ming He, Cathryn Christiansen, Kunaljeet Tanwar, Frieder H. Baumann, Patrick W. DeHaven, Samuel S. Choi, J. Rowland, T. Ryan, Hoon Kim, Leo Tai, A. Simon, Anita Madan, Donald F. Canaperi, Tibor Bolom, X. Zhang, Steven E. Molis, F. Ito, Akira Uedono, Philip L. Flaitz, C.-K. Hu, R. J. Davis, Daniel C. Edelstein, R. Murphy, Christopher Parks, Christopher J. Penny, Terry A. Spooner, James J. Kelly, James Chingwei Li, Sunny Chiang, Takeshi Nogami
Publikováno v:
2012 International Electron Devices Meeting.
Cu(Mn) alloy seed BEOL studies revealed fundamental insights into Mn segregation and EM enhancement. We found a metallic-state Mn-rich Cu layer under the MnOx layer at the Cu/SiCNH cap interface, and correlated this metallic layer with additional EM