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pro vyhledávání: '"Kumar, Rishdeo"'
Autor:
Bhattacharyya, A. S., Kumar, Rishdeo, Raj, Vikrant, Shrinidhi, S., Suman, Shrishti, Shah, Asmita, Kumar, Ramgiri P.
The article consists of four sections all dealing with the computational modeling of the sputtering process. The first section deals with the difference in Bismuth atomic layer deposition at different polar angle and ion flounce. In the second sectio
Externí odkaz:
http://arxiv.org/abs/1604.02020