Výsledky vyhledávání - "Kuej Chun Hung"

Compensation of resist trim process and polygate plasma microloading effect for lithography process window and CD uniformity improvement

Autor: Kuej Chun Hung, Cheng Wen Fan, Kay Ming Lee, Chih Chiang Liu, H T Chuang, Jiunn-Ren Huang

Publikováno v: SPIE Proceedings.

Poly-gate critical dimension (CD) control has become a major concern as technology advances towards the 130nm node. The presence of optical proximity and plasma microloading effects in today's IC fabrication has a severe impact on through-pitch CD un

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e76477d444af3032cb6b337ff75820a3
https://doi.org/10.1117/12.473429

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