Zobrazeno 1 - 10
of 300
pro vyhledávání: '"Kuech, Thomas F."'
Publikováno v:
J. Chem. Phys. 158, 074105 (2023)
Activation barriers associated with ion diffusion and chemical reactions are vital to understand and predict a wide range of phenomena, such as material growth, ion transport, and catalysis. In the calculation of activation barriers for non-redox pro
Externí odkaz:
http://arxiv.org/abs/1712.01686
Publikováno v:
NPG Asia Materials 9, e345 (2017)
Technological applications of novel metastable materials are frequently inhibited by abundant defects residing in these materials. Using first-principles methods we investigate the point defect thermodynamics and phase segregation in the technologica
Externí odkaz:
http://arxiv.org/abs/1611.03031
Publikováno v:
Appl. Phys. Lett. 109, 112104 (2016)
Significant efficiency droop is a major concern for light-emitting diodes and laser diodes operating at high current density. Recent study has suggested that heavily Bi-alloyed GaAs can decrease the non-radiative Auger recombination and therefore all
Externí odkaz:
http://arxiv.org/abs/1609.00335
Autor:
Krishna, Siddarth H., Zhang, Lifeng, Hermans, Ive, Huber, George W., Kuech, Thomas F., Dumesic, James A.
Publikováno v:
In Journal of Catalysis September 2020 389:111-120
Publikováno v:
In Journal of Crystal Growth 15 May 2020 538
Publikováno v:
In Journal of Physics and Chemistry of Solids March 2020 138
Publikováno v:
In Journal of Crystal Growth 1 May 2019 513:58-68
Publikováno v:
In Journal of Crystal Growth 1 February 2019 507:255-259
Publikováno v:
In Current Opinion in Solid State & Materials Science December 2018 22(6):229-242
Publikováno v:
In Journal of Power Sources 1 January 2018 373:184-192