Alpha-Fe2O3 films for photoelectrochemical water oxidation – insights of key performance parameters

Autor: Jia, L., Harbauer, K., Bogdanoff, P., Herrmann-Geppert, I., Ramirez, A., Krol, R.van de, Fiechter, S.

Publikováno v: Jia, L.; Harbauer, K.; Bogdanoff, P.; Herrmann-Geppert, I.; Ramirez, A.; Krol, R.van de; Fiechter, S.: Alpha-Fe2O3 films for photoelectrochemical water oxidation – insights of key performance parameters. In: Journal of Materials Chemistry A. Vol. 2 (2014) 47, 20196-20202. (DOI: 10.1039/c4ta04720f)

We report the deposition of ultra-thin α-Fe2O3 (hematite) films on fluorine-doped tin oxide (FTO) substrates using radio frequency (RF) sputtering, and the investigation of their photoelectrochemical (PEC) performance towards water oxidation. By var

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