Zobrazeno 1 - 10
of 116
pro vyhledávání: '"Krivtsun, V."'
Autor:
Grigoryev, S. Yu., Lakatosh, B. V., Krivokorytov, M. S., Zhakhovsky, V. V., Dyachkov, S. A., Ilnitsky, D. K., Migdal, K. P., Inogamov, N. A., Vinokhodov, A. Yu., Kompanets, V. O., Sidelnikov, Yu. V., Krivtsun, V. M., Koshelev, K. N., Medvedev, V. V.
Publikováno v:
Phys. Rev. Applied 10, 064009 (2018)
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the experiment show that the fast one-side heating of such a droplet may lea
Externí odkaz:
http://arxiv.org/abs/1807.01862
Autor:
Krivokorytov, M. S., Vinokhodov, A. Yu., Sidelnikov, Yu. V., Krivtsun, V. M., Medvedev, V. V., Kompanets, V. O., Lash, A. A., Koshelev, K. N.
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed with laser irradiance varying in 10E13-10E15 W/cm^2 range. The observed e
Externí odkaz:
http://arxiv.org/abs/1604.03690
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., Lopaev, D. V., van der Horst, R. M., Beckers, J., Osorio, E. A., Bijkerk, F.
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured ele
Externí odkaz:
http://arxiv.org/abs/1603.08130
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Yakushev, O., Koshelev, K. N., Lopaev, D. V., Bijkerk, F.
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion
Externí odkaz:
http://arxiv.org/abs/1507.02705
Autor:
Gubarev, V., Krivokorytov, M., Krivtsun, V., Novikova, N., Yakunin, S., Pal, A., Ramirez B, Javier A., Krasnikov, D., Medvedev, V., Nasibulin, A. G.
Publikováno v:
Journal of Applied Physics; 3/7/2023, Vol. 133 Issue 9, p1-8, 8p
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Zotovich, A. I., Zyryanov, S. M., Lopaev, D. V., Bijkerk, F.
Publikováno v:
Plasma Sources Sci. Technol. 24, 055018 (2015)
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low densit
Externí odkaz:
http://arxiv.org/abs/1412.3036
Publikováno v:
2015 Plasma Sources Sci. Technol. 24 035003
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; c
Externí odkaz:
http://arxiv.org/abs/1411.4505
Autor:
Dolgov, A, Lopaev, D, Rachimova, T, Kovalev, A, Vasilyeva, A, Lee, C J, Krivtsun, V M, Yakushev, O, Bijkerk, F
Publikováno v:
2014 J. Phys. D: Appl. Phys. 47 065205
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave dischar
Externí odkaz:
http://arxiv.org/abs/1310.4057
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Autor:
Dolgov, A., Lee, C. J., Bijkerk, F., Abrikosov, A., Krivtsun, V. M., Lopaev, D., Yakushev, O., van Kampen, M.
Publikováno v:
Journal of Applied Physics; 2018, Vol. 123 Issue 15, p1-N.PAG, 9p