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pro vyhledávání: '"Kriti K. Kohli"'
Publikováno v:
SPIE Proceedings.
Sub-Resolution Assist Feature (SRAF) printing is a critical yield detractor and known issue in OPC technology. SRAF print avoidance models can be used to determine where undesirable printing is likely to occur, but such models lack the necessary robu
Autor:
Archana Subramaniyan, Neal A. Makela, Richard Murphy, Christopher C. Parks, Anita Madan, Domingo A. Ferrer Luppi, Frieder H. Baumann, Lawrence Bauer, Kriti K. Kohli
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Titanium nitride (TiN), a refractory material is actively been used as a diffusion barrier in Middle-of-the-Line (MOL) contacts. In the typical MOL stack (titanium (Ti)/TiN/tungsten(W)), it acts as a fluorine (F) diffusion barrier and also as an adhe