Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Kristian Pontoppidan Larsen"'
Publikováno v:
Journal of Micromechanics and Microengineering. 15:873-882
This work investigates the isotropic etching properties of an inductively coupled plasma (ICP) etcher for masked and maskless etching steps in reference to fabrication of a silicon microlens mold. Using the described method a wide range of lens geome
Autor:
Anette Alsted Rasmussen, Kristian Pontoppidan Larsen, Morten Ginnerup, Ole Hansen, Jan Tue Ravnkilde
Publikováno v:
Sensors and Actuators A: Physical. 103:156-164
In situ bending test devices with integrated electrostatic actuator were fabricated in electroplated nanocrystalline nickel. The device features approximately pure in-plane bending of the test beam. The excitation of the test beam has fixed displacem
Publikováno v:
Larsen, K P, Petersen, D H & Hansen, O 2006, ' Study of the roughness in a photoresist masked, isotropic, SF6-based ICP silicon etch ', Journal of The Electrochemical Society, vol. 153, no. 12, pp. G1051-G1058 . https://doi.org/10.1149/1.2357723
In this paper we study the etching behavior and the resulting roughness in photoresist-masked isotropic silicon plasma etch performed in an inductively coupled plasma (ICP) etcher using SF6. We report detailed observations of the resulting roughness
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f18b5872a9523ba6271ecee079e151c
https://orbit.dtu.dk/en/publications/f2c1866f-a709-4199-b8fe-6f0b0c02b0ef
https://orbit.dtu.dk/en/publications/f2c1866f-a709-4199-b8fe-6f0b0c02b0ef
Publikováno v:
Larsen, K P, Ravnkilde, J T & Hansen, O 2003, SOI silicon on glass for optical MEMS . in Proceedings of the 12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers) . IEEE, pp. 1655-1658, 12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers), Boston, United States, 09/06/2003 .
A newly developed fabrication method for fabrication of single crystalline Si (SCS) components on glass, utilizing Deep Reactive Ion Etching (DRIE) of a Silicon On Insulator (SOI) wafer is presented. The devices are packaged at wafer level in a glass
Publikováno v:
Larsen, K P, Ravnkilde, J T, Ginnerup, M & Hansen, O 2002, Devices for fatigue testing of electroplated nickel (MEMS) . in The Fifteenth IEEE International Conference on Micro Electro Mechanical Systems, 2002. . IEEE, pp. 443-446, 15th IEEE International Conference on Micro Electro Mechanical Systems, Las Vegas, NV, United States, 20/01/2002 . https://doi.org/10.1109/MEMSYS.2002.984298
ResearcherID
Scopus-Elsevier
ResearcherID
Scopus-Elsevier
In-situ fatigue test devices with integrated electrostatic actuator were fabricated in electroplated nanocrystalline nickel (nano-nickel). The devices feature in-plane approximately pure bending with fixed displacement of the test specimen of the dim
Publikováno v:
Journal of Micromechanics & Microengineering; Apr2005, Vol. 15 Issue 4, p873-882, 10p