Zobrazeno 1 - 10
of 78
pro vyhledávání: '"Krawicz, A."'
Akademický článek
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Autor:
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, Tomoya Onitsuka, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kosuke Yoshihara, John S. Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe, Lior Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, Kathleen Nafus, Angélique Raley
Publikováno v:
Journal of Photopolymer Science and Technology. 35:87-93
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f4b7fc72090c6d1d25fcf7d25835c6a
https://doi.org/10.2494/photopolymer.35.87
https://doi.org/10.2494/photopolymer.35.87
Autor:
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua D. LaRose, Jeffrery C. Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45726dd0148c7dbb78756f0430b9d1a4
https://doi.org/10.1117/12.2642941
https://doi.org/10.1117/12.2642941
Autor:
Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a28a45c5dd27e45f08ae7af37c1ea4b4
https://doi.org/10.1117/12.2642878
https://doi.org/10.1117/12.2642878
Autor:
Angélique Raley, Lior Huli, Steven Grzeskowiak, Katie Lutker-Lee, Alexandra Krawicz, Yannick Feurprier, Eric Liu, Kanzo Kato, Kathleen Nafus, Arnaud Dauendorffer, Nayoung Bae, Josh LaRose, Andrew Metz, Dave Hetzer, Masanobu Honda, Tetsuya Nishizuka, Akiteru Ko, Soichiro Okada, Yasuyuki Ido, Tomoya Onitsuka, Shinichiro Kawakami, Seiji Fujimoto, Satoru Shimura, Cong Que Dinh, Makoto Muramatsu, Peter Biolsi, Hiromasa Mochiki, Seiji Nagahara
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37450dbca4d37463b6cc1c0a071567bf
https://doi.org/10.1117/12.2613063
https://doi.org/10.1117/12.2613063
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
Dave Hetzer, Alexandra Krawicz, Luciana Meli, Alex Hubbard, Cody Murray, Christopher Cole, Shinichiro Kawakami, Karen Petrillo, Soichiro Okada, Akihiro Sonoda, Kanzo Kato, Lior Huli, Naoki Shibata, Satoru Shimura, Takahiro Kitano, Angelique Raley
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
As the industry continues to push the limits of integrated circuit fabrication, reliance on EUV lithography has increased. Additionally, it has become clear that new techniques and methods are needed to mitigate pattern defectivity and roughness at L
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5a67765648aab4b0a480a914b3fc6ed
https://doi.org/10.1117/12.2602829
https://doi.org/10.1117/12.2602829
Autor:
Bannister, Julie, Mohanty, Nihar, Raley, Angélique, Huli, Lior, Grzeskowiak, Steven, Lutker-Lee, Katie, Krawicz, Alexandra, Feurprier, Yannick, Liu, Eric, Kato, Kanzo, Nafus, Kathleen, Dauendorffer, Arnaud, Bae, Nayoung, LaRose, Josh, Metz, Andrew, Hetzer, Dave, Honda, Masanobu, Nishizuka, Tetsuya, Ko, Akiteru, Okada, Soichiro, Ido, Yasuyuki, Onitsuka, Tomoya, Kawakami, Shinichiro, Fujimoto, Seiji, Shimura, Satoru, Dinh, Cong Que, Muramatsu, Makoto, Biolsi, Peter, Mochiki, Hiromasa, Nagahara, Seiji
Publikováno v:
Proceedings of SPIE; May 2022, Vol. 12056 Issue: 1 p120560A-120560A-13, 11935454p
Autor:
Vincent Meunier, Alexandra Krawicz, Sudipan Saha, Adrien Nicolaï, Peter H. Dinolfo, Jonathan R. Owens, Kim M. Lewis
Publikováno v:
ACS Applied Materials & Interfaces. 7:10085-10090
We report bistability in current-voltage curves from di(PEP)PorZn in an electromigrated molecular junction. Bistability was observed at ±0.3 V at 300 K but did not occur at 4 K. No bistability was identified at 300 K for another porphyrin molecule (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f21c60d029cda8fa0e4851df7661d416
https://doi.org/10.1021/acsami.5b02449
https://doi.org/10.1021/acsami.5b02449
Publikováno v:
The Journal of Physical Chemistry Letters. 5:3222-3226
Attachment of difluoroborylcobaloxime catalysts to a polymer-brush-modified GaP semiconductor allows improved hydrogen production levels and photoelectrochemical performance under aqueous acidic conditions (pH = 4.5) as compared to the performance of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3967bf592a870bfd261093c03ac00fa6
https://doi.org/10.1021/jz5016394
https://doi.org/10.1021/jz5016394