Zobrazeno 1 - 10
of 126
pro vyhledávání: '"Kraus, PM"'
Autor:
Bijloo F; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics of Information in Matter and Center for Nanophotonics, NWO-I Institute AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands., Murzyn K; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., van Emmerik F; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., den Boef AJ; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, 1081 HV Amsterdam, The Netherlands.; ASML Netherlands B.V., 5504 DR Veldhoven, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, 1081 HV Amsterdam, The Netherlands., Koenderink AF; Department of Physics of Information in Matter and Center for Nanophotonics, NWO-I Institute AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands.
Publikováno v:
Nano letters [Nano Lett] 2024 Oct 02. Date of Electronic Publication: 2024 Oct 02.
Enhancing the efficiency of high-order harmonics with two-color non-collinear wave mixing in silica.
Autor:
Roscam Abbing SDC; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., Kuzkova N; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV, Amsterdam, The Netherlands., van der Linden R; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., Campi F; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., de Keijzer B; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., Morice C; Institute for Theoretical Physics and Delta Institute for Theoretical Physics, University of Amsterdam, 1090 GL, Amsterdam, The Netherlands., Zhang ZY; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., van der Geest MLS; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG, Amsterdam, The Netherlands. p.kraus@arcnl.nl.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV, Amsterdam, The Netherlands. p.kraus@arcnl.nl.
Publikováno v:
Nature communications [Nat Commun] 2024 Sep 27; Vol. 15 (1), pp. 8335. Date of Electronic Publication: 2024 Sep 27.
Autor:
van Essen PJ; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Nie Z; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., de Keijzer B; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands.
Publikováno v:
ACS photonics [ACS Photonics] 2024 Apr 24; Vol. 11 (5), pp. 1832-1843. Date of Electronic Publication: 2024 Apr 24 (Print Publication: 2024).
Autor:
Sadegh N; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Evrard Q; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands., Brouwer AM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; van 't Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands.
Publikováno v:
The journal of physical chemistry. C, Nanomaterials and interfaces [J Phys Chem C Nanomater Interfaces] 2024 Feb 27; Vol. 128 (9), pp. 3965-3974. Date of Electronic Publication: 2024 Feb 27 (Print Publication: 2024).
Following the Nonthermal Phase Transition in Niobium Dioxide by Time-Resolved Harmonic Spectroscopy.
Autor:
Nie Z; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Guery L; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Molinero EB; Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas (ICMM-CSIC), E-28049 Madrid, Spain., Juergens P; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy, Max-Born-Strasse 2A, D-12489 Berlin, Germany., van den Hooven TJ; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Wang Y; School of Physics and Electronic Engineering, Taishan University 525 Dongyue Street, Tai'an, Shandong, China., Jimenez Galan A; Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy, Max-Born-Strasse 2A, D-12489 Berlin, Germany., Planken PCM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Van der Waals-Zeeman Institute, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands., Silva REF; Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas (ICMM-CSIC), E-28049 Madrid, Spain.; Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy, Max-Born-Strasse 2A, D-12489 Berlin, Germany., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105,1081 HV Amsterdam, The Netherlands.
Publikováno v:
Physical review letters [Phys Rev Lett] 2023 Dec 15; Vol. 131 (24), pp. 243201.
Autor:
van der Geest MLS; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands., de Boer JJ; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Murzyn K; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands., Jürgens P; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands.; Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy, D-12 489 Berlin, Germany., Ehrler B; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands.
Publikováno v:
The journal of physical chemistry letters [J Phys Chem Lett] 2023 Dec 07; Vol. 14 (48), pp. 10810-10818. Date of Electronic Publication: 2023 Nov 28.
Autor:
Kaplan, CJ, Kraus, PM, Gullikson, EM, Borja, LJ, Cushing, SK, Zürch, M, Chang, HT, Neumark, DM, Leone, SR
Publikováno v:
Journal of the Optical Society of America B: Optical Physics, vol 36, iss 6
The complex-valued index of refraction of germanium in the extreme ultraviolet (XUV) is measured by multiangle reflectance of synchrotron radiation. The resulting index of refraction is higher resolution than previously measured values. It reveals ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::951116ed2794fafa96ce399e44b8c71f
https://escholarship.org/uc/item/4w2271bj
https://escholarship.org/uc/item/4w2271bj
Autor:
van der Geest MLS; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., McGovern L; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., van Vliet S; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Zwaan HY; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Grimaldi G; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands.; Cavendish Laboratory, University of Cambridge,CB2 1TN Cambridge, United Kingdom., de Boer J; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Bliem R; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands., Ehrler B; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands.
Publikováno v:
The journal of physical chemistry. C, Nanomaterials and interfaces [J Phys Chem C Nanomater Interfaces] 2022 Aug 04; Vol. 126 (30), pp. 12554-12562. Date of Electronic Publication: 2022 Jul 21.
Autor:
Roscam Abbing SDC; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands., Kolkowski R; Center for Nanophotonics, AMOLF, Science Park 104, 1098XG Amsterdam, Netherlands.; Optics and Photonics Group, Department of Applied Physics, Aalto University, P.O. Box 13500, FI-00076 Aalto, Finland., Zhang ZY; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands., Campi F; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands., Lötgering L; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands., Koenderink AF; Center for Nanophotonics, AMOLF, Science Park 104, 1098XG Amsterdam, Netherlands., Kraus PM; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1081, 1081HV Amsterdam, Netherlands.
Publikováno v:
Physical review letters [Phys Rev Lett] 2022 Jun 03; Vol. 128 (22), pp. 223902.
Autor:
Jager, MF, Ott, C, Kraus, PM, Kaplan, CJ, Pouse, W, Marvel, RE, Haglund, RF, Neumark, DM, Leone, SR
Publikováno v:
Jager, MF; Ott, C; Kraus, PM; Kaplan, CJ; Pouse, W; Marvel, RE; et al.(2017). Tracking the insulator-to-metal phase transition in VO2with few-femtosecond extreme UV transient absorption spectroscopy. Proceedings of the National Academy of Sciences of the United States of America, 114(36), 9558-9563. doi: 10.1073/pnas.1707602114. UC Berkeley: Retrieved from: http://www.escholarship.org/uc/item/9fw337nr
© 2017, National Academy of Sciences. All rights reserved. Coulomb correlations can manifest in exotic properties in solids, but how these properties can be accessed and ultimately manipulated in real time is not well understood. The insulator-to-me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::721ecf31fb3104b3b980a329aae94a5b
http://www.escholarship.org/uc/item/9fw337nr
http://www.escholarship.org/uc/item/9fw337nr