Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Kozo Ogino"'
Autor:
Haruo Tsuchikawa, Hiromi Hoshino, Yasuhide Machida, Yoshinori Kojima, Kozo Ogino, Takashi Maruyama, Shinji Sugatani
Publikováno v:
Microelectronic Engineering. 87:1131-1134
When manufacturing prototype devices or small volume production custom logic LSIs, the products are being less profitable because of the skyrocketing mask and design costs recent technology node. For 65nm technology node and beyond, the reduction of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fde139ccacdd484911d3c0081bcc2a4c
https://doi.org/10.1016/j.mee.2009.11.037
https://doi.org/10.1016/j.mee.2009.11.037
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2032-2038
The simplified electron energy flux (SEEF)model by which the backscattered energy distribution in the multilayered structure is calculated has been applied to the analysis of critical dimension (CD) variations caused by the thickness variations in co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9dd70a2af2e222588f0eea283574c915
https://doi.org/10.1116/1.3013861
https://doi.org/10.1116/1.3013861
Publikováno v:
Japanese Journal of Applied Physics. 46:6171-6177
In this study, a simplified electron energy flux (SEEF) model for electron-beam (EB) lithography has been evaluated by comparing it with the Monte Carlo (MC) simulation for copper (Cu) wiring layers. The parameters of the SEEF model in each layer dep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bca894896ec1b0f64abde19c559c1a70
https://doi.org/10.1143/jjap.46.6171
https://doi.org/10.1143/jjap.46.6171
Autor:
Morimi Osawa, Kimitoshi Takahashi, Yasuhide Machida, Hiroshi Arimoto, Hiromi Hoshino, H. Yamashita, Kozo Ogino
Publikováno v:
Japanese Journal of Applied Physics. 42:3827-3832
We have proposed the techniques of the pattern shape modification method and the pattern density reduction method as a proximity effect correction (PEC) for electron-beam projection lithography.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cba9bea1999078eddbeda10868b3d8c3
https://doi.org/10.1143/jjap.42.3827
https://doi.org/10.1143/jjap.42.3827
Autor:
Kozo Ogino, Hiromi Hoshino, Kimitoshi Takahashi, Yasuhide Machida, Morimi Osawa, Hiroshi Arimoto
Publikováno v:
Japanese Journal of Applied Physics. 41:4167-4172
The pattern shape modification method is an effective proximity effect correction technique for electron-beam projection lithography (EPL) systems. We used two characteristics based on the large difference between the forward and backscattering range
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3720241a1ac7b5fa209902aa669e5e35
https://doi.org/10.1143/jjap.41.4167
https://doi.org/10.1143/jjap.41.4167
Publikováno v:
Alternative Lithographic Technologies IV.
We propose an advanced proximity effect correction method, in which all patterns of various sizes are written by character projection (CP) method, and the dose modulation and the auxiliary shot generation are performed using multiple area density map
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f235816cbe216fab81ba309eb9a9cf30
https://doi.org/10.1117/12.916353
https://doi.org/10.1117/12.916353
Autor:
Yoshinori Kojima, Masaki Takakuwa, Hiromi Hoshino, Ryo Tujimura, Jun-ichi Kon, Yoshio Ito, Yasushi Takahashi, Shinji Sugatani, Shuzo Ohshio, Hiroshi Takita, Masaaki Miyajima, Kozo Ogino
Publikováno v:
Alternative Lithographic Technologies IV.
Techniques to appropriately control the key factors for a character projection (CP) based electron beam direct writing (EBDW) technology for mass production are shown and discussed. In order to achieve accurate CD control, the CP technique using the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b65e6d47d0ba913924817be63ec2dbbb
https://doi.org/10.1117/12.916338
https://doi.org/10.1117/12.916338
Autor:
Tomoyuki Okada, Satoru Asai, Motoshu Miyajima, Satoshi Yamauchi, Tatsuo Chijimatsu, Hiromi Hoshino, Kazumasa Morishita, Ryo Tsujimura, Shigeo Satoh, Hiroki Futatsuya, Kozo Ogino, Naoyuki Ishiwata, Satoshi Yoshikawa
Publikováno v:
SPIE Proceedings.
The computer cost for mask data processing grows increasingly more expensive every year. However the Graphics Processing Unit (GPU) has evolved dramatically. The GPU which originally was used exclusively for digital image processing has been used in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72c06407e686279bd4b6889e3c0efdaf
https://doi.org/10.1117/12.899496
https://doi.org/10.1117/12.899496
Autor:
Shinji Sugatani, Yoshinori Kojima, Takashi Maruyama, Kozo Ogino, Hiromi Hoshino, Masaaki Miyajima, Yasuhide Machida
Publikováno v:
SPIE Proceedings.
It is commonly known that maskless lithography is the most effective technology to reduce costs and shorten the time need for recent photo-mask making techniques. In mass production, however, lithography using photo-masks is used because that method
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee428a74777b678d433f1df321200b93
https://doi.org/10.1117/12.773189
https://doi.org/10.1117/12.773189
Model-based lithography verification system for multilayer structure in electron-beam direct writing
Publikováno v:
SPIE Proceedings.
In the high-energy electron-beam lithography, proximity effects caused by the multilayer structure including heavy-metal materials are crucial for the resist patterning. The proximity effect depends not only on the pattern arrangement in the underlyi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::828f722d07a7a5bd7e33076e0611a83c
https://doi.org/10.1117/12.656105
https://doi.org/10.1117/12.656105