Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Koutaro Endo"'
Publikováno v:
Journal of Photopolymer Science and Technology. 15:667-671
Recently, fluoropolymers have become promising base resins for single-layer resist uses in 157nm lithography. The 157nm positive-tone resists we studied displayed good optical transparency at 157nm (absorption coefficient of 1.9 to 2.7μm-1). In addi
Autor:
Nobuhiko Sunohara, Toyokazu Saito, Sari Higuchi, Eishun Nitta, Makiko Nishina, Akihito Suenaga, Shoji Tsuji, Akihiro Matsushima, Masaaki Konagaya, Keiko Tanaka, Kazuya Honke, Ryozo Satake, Masaharu Takamori, Soichi Okino, Tomoya Asaka, Toshiro Yoshimura, Koutaro Endo, Mariko Shinagawa, Takuo Oyake, Hajime Tanaka, Ken Ikeuchi, Eiichiro Uyama, Hiroshi Takada, Reiko Namba, Kiyonobu Komai, Yasuki Takizawa
Publikováno v:
Journal of human genetics. 46(11)
Autosomal recessive distal myopathy or Nonaka distal myopathy (NM) is characterized by its unique distribution of muscular weakness and wasting. The patients present with spared quadriceps muscles even in a late stage of the disease. The hamstring an
Publikováno v:
SPIE Proceedings.
We are reporting on the development of acryl polymer based on novel methacrylate and acrylate monomers with various trifluoromethyl groups for the application to 157nm chemically amplified positive-tone resists. The (alpha) - trifluoromethylation of