Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Kouji Shimamoto"'
Autor:
Kouji Shimamoto, Manabu Ataka, Takushi Gouda, Hiroyuki Fujita, Kuniyuki Kakushima, Yoshimasa Isono, Toshiyuki Watanabe, Hidenori Mimura, Yutaka Mihara, Gen Hashiguchi
Publikováno v:
IEEJ Transactions on Sensors and Micromachines. 124:248-254
An arrayed atomic force microscope (AFM) cantilevers were fabricated for parallel scanning probe lithography (SPL). n-octadecyltrimethoxysilane (ODS) self-assembled monolayer (SAM) films were patterned to form 100nm-width lines. Parallel SPL was demo
Autor:
Toshio Baba, Kiminari Kawano, Nobuyuki Arima, Ritsuo Matsumoto, Haruhiko Miyayama, Reiki Nishimura, Kouji Shimamoto, Kaori Umeda
Publikováno v:
The Journal of the Japanese Society of Clinical Cytology. 43:363-369
目的:乳癌における術中迅速センチネルリンパ節 (sentinel lymph node: SLN) 捺印細胞診への免疫細胞化学 (immunocytochemistry: ICC) 併用の有用性を検討した.方法:2003年6月から2004年2月までのICCを併用
Autor:
Kiminari Kawano, Kaori Umeda, Ritsuo Matsumoto, Haruhiko Miyayama, Kouji Shimamoto, Mayumi Kanemoto, Toshio Baba
Publikováno v:
The Journal of the Japanese Society of Clinical Cytology. 38:254-258
性器外に原発する絨毛癌の中で, 肺原発の男性絨毛癌はまれである. 最近, その発生起源を腺癌の異分化に求める説も唱えられている.本症例は, 76歳, 男性で背部痛と血疾で来院. 喀疾細胞
Autor:
M. Ataka, Kouji Shimamoto, Gen Hashiguchi, Y. Mihara, Hidenori Mimura, Kuniyuki Kakushima, M. Watanabe, Yoshitada Isono, T. Gouda, Hiroyuki Fujita
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.
Arrayed AFM probes have been fabricated, and parallel scanning probe lithography (SPL) has been demonstrated to draw uniform patterns with good alignment accuracy. We have shown that the combination of UV lithography with parallel SPL is feasible for
Autor:
Hiroyuki Fujita, T. Hiramoto, Hidenori Mimura, Gen Hashiguchi, Yoshitada Isono, Kouji Shimamoto, Y. Mihara
Publikováno v:
TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664).
This research proposes a novel fabrication of silicon nanowire with a nanometric island between tunnel junctions for single electron transistor (SET). The scanning probe microscope (SPM)-based nanolithography (SPNL) using a field-enhanced anodization
Autor:
Kouji Shimamoto, Toshiyuki Watanabe, Yoshimasa Isono, Hiroyuki Fujita, Hidenori Mimura, Manabu Ataka, Takushi Gouda, Yutaka Mihara, Kuniyuki Kakushima, Gen Hashiguchi
Publikováno v:
Japanese Journal of Applied Physics. 43:4041
Arrayed atomic force microscope (AFM) cantilevers for parallel scanning probe lithography (SPL) have been fabricated by silicon micromachining. Fabrication is based on three KOH etching steps and local oxidation processes. The curvature radius of the