Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Kouji Kakizaki"'
Autor:
Yasufumi Kawasuji, Akira Suwa, Yasuhiro Adachi, Tomonari Tanaka, Kouji Kakizaki, Masakazu Washio
Publikováno v:
Journal of Laser Micro / Nanoengineering; Feb2024, Vol. 19 Issue 1, p46-50, 5p
Publikováno v:
Journal of Laser Micro / Nanoengineering; Sep2023, Vol. 18 Issue 2, p83-86, 4p
Publikováno v:
Journal of Laser Micro / Nanoengineering; Dec2022, Vol. 17 Issue 3, p133-140, 8p
Publikováno v:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI.
An organic build-up film is used as the substrate material for a semiconductor multi-die package. However, the miniaturization of the organic build-up film process by the commonly used 355 nm UV laser has almost reached the limit due to its long wave
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a57f714e5058f995b3ca8446aea5d72c
https://doi.org/10.1117/12.2578165
https://doi.org/10.1117/12.2578165
Autor:
Akira Suwa, Yasufumi Kawasuji, Masakazu Kobayashi, Yasuhiro Adachi, Masakazu Washio, Kouji Kakizaki
Publikováno v:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI.
In this study, we are developing the process of glass ablation by 248nm excimer to make micro-via to the glass material. The interposer connects many pins between both sides electrically. Therefore, the micro-via to the glass substrate must be needed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5d1660a6b6fbb745c946da438d40ec5
https://doi.org/10.1117/12.2578038
https://doi.org/10.1117/12.2578038
Publikováno v:
Novel Patterning Technologies 2021.
High performance, high speed processing, and miniaturization of electronic devices are advancing, due to the rapid development of highly advanced information society in recent years. Semiconductors continue to be highly integrated according to Moore'
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c7f788a5576404790d2e5d8c45fb1b5
https://doi.org/10.1117/12.2583901
https://doi.org/10.1117/12.2583901
Publikováno v:
Handbook of Laser Micro-and Nano-Engineering ISBN: 9783319695372
Handbook of Laser Micro-and Nano-Engineering
Handbook of Laser Micro-and Nano-Engineering
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::866326d01bf437e4cdf57c771588b583
https://doi.org/10.1007/978-3-319-69537-2_53-1
https://doi.org/10.1007/978-3-319-69537-2_53-1
Advanced spectral engineering: Lithography performance improvements by high performance light source
Autor:
Yosuke Fujimaki, Kouichi Fujii, Hakaru Mizoguchi, Junichi Fujimoto, Takahito Kumazaki, Toshihiro Oga, Masakazu Hattori, Kouji Kakizaki
Publikováno v:
Optical Microlithography XXXIII.
In modern semiconductor lithography world, doubtlessly, scanners using DUV as light source still be main work horses to push physical limits of semiconductor devices to a new level. Meanwhile, as the semiconductor devices diversified to many differen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95ea54b05a7ecb9d763abe70c5796f09
https://doi.org/10.1117/12.2551966
https://doi.org/10.1117/12.2551966
Autor:
Yasuhiro Kamba, Yoshihiko Murakami, Hiroaki Oizumi, Kouji Kakizaki, Takashi Onose, Taisuke Miura, Hironori Igarashi
Publikováno v:
Laser Congress 2020 (ASSL, LAC).
We demonstrated a precise laser machining on SiC/SiC CMC plate using short pulsed hybrid ArF laser at the wavelength of 193 nm. We made 3x3 squared holes with dimension of 0.4×0.4 mm2.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b6db34928d6dc6cb5cb8843505c4d9e
https://doi.org/10.1364/assl.2020.jth6a.26
https://doi.org/10.1364/assl.2020.jth6a.26
Autor:
Chen Qu, Yoshihiko Murakami, Hironori Igarashi, Yohei Tanaka, Yuki Tamaru, Taisuke Miura, Kouji Kakizaki, Atsushi Fuchimukai
Publikováno v:
Laser Congress 2020 (ASSL, LAC).
We report a 193 nm solid state laser based on 1030 nm laser and 1550 nm laser which is generated by two-stage OPA. 110 mW output power and 0.5 pm spectral width was achieved.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5aab3f19d1fa968cf54f5f6396503021
https://doi.org/10.1364/assl.2020.jth6a.2
https://doi.org/10.1364/assl.2020.jth6a.2