Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Kouji Hosono"'
Autor:
Yasuhiro Matsuo, Makoto Kawamukai, Kouji Hosono, Ikuhisa Nishida, Tomohiro Kaino, Kazuhiro Hayashi, Kazumasa Yokomi
Publikováno v:
Applied Microbiology and Biotechnology. 103:4899-4915
Coenzyme Q (CoQ) is an essential component of the electron transport system that produces ATP in nearly all living cells. CoQ10 is a popular commercial food supplement around the world, and demand for efficient production of this molecule has increas
Autor:
Ikuhisa, Nishida, Kazumasa, Yokomi, Kouji, Hosono, Kazuhiro, Hayashi, Yasuhiro, Matsuo, Tomohiro, Kaino, Makoto, Kawamukai
Publikováno v:
Applied microbiology and biotechnology. 103(12)
Coenzyme Q (CoQ) is an essential component of the electron transport system that produces ATP in nearly all living cells. CoQ
Autor:
Makoto Kawamukai, Makoto Fujii, Daisuke Moriyama, Hirokazu Nanba, Tomohiro Kaino, Motohisa Washida, Kouji Hosono
Publikováno v:
Bioscience, Biotechnology, and Biochemistry. 79:1026-1033
Coenzyme Q10 (CoQ10) is essential for energy production and has become a popular supplement in recent years. In this study, CoQ10 productivity was improved in the fission yeast Schizosaccharomyces pombe. Ten CoQ biosynthetic genes were cloned and ove
Autor:
Shuichiro Fukumitsu, Kouji Hosono, Kouji Nakamura, Tatsuo Kuwayama, Fuyuki Hirose, Tetsuo Hashimoto, Hiroshi Ueno
Publikováno v:
Zisin (Journal of the Seismological Society of Japan. 2nd ser.). 58:261-271
Autor:
Yuichiro Hotta, Shigeru Noguchi, Hiroyuki Miyashita, Naoyuki Ishiwata, Yutaka Miyahara, Youhei Yamashita, Minoru Naitou, Hiroshi Maruyama, Syuichi Sanki, Tomohiko Furukawa, Satoru Asai, Kouji Hosono
Publikováno v:
SPIE Proceedings.
This paper presents about 65 nm-node alternating phase shift mask (APSM) fabrication. One of issue in fabrication of 65 nm-node APSM is second layer patterning process. As chromium (Cr) pattern CD becomes narrow, tighter edge placement accuracy of se
Publikováno v:
SPIE Proceedings.
Process optimizations have been done to produce 'Fine Pattern' reticles whose minimum target sizes are under 720 nm. 'Zero Bias' process for binary Cr reticles can be achieved with our dry etching process using ZEP-7000 blanks. MEBES-4500 exposure on
Autor:
Toshiaki Kawabata, Junichi Kai, Kouji Hosono, Eiichi Hoshino, Junji Hirumi, Tetsuya Hayashimoto
Publikováno v:
SPIE Proceedings.
The budget of reticle pattern placement error, using variable-shaped step and repeat electron beam writer has been studied. There are three major factors in the reticle writing process, the stage moving accuracy, the electron beam deflection accuracy
Autor:
Daisuke Moriyama, Kouji Hosono, Makoto Fujii, Motohisa Washida, Hirokazu Nanba, Tomohiro Kaino, Makoto Kawamukai
Publikováno v:
Bioscience, Biotechnology & Biochemistry; Jun2015, Vol. 79 Issue 6, p1026-1033, 8p