Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Kouichi Hirose"'
Autor:
Koushiro Yamashita, Yorinobu Maeda, Kouichi Hirose, Kohei Fukami, Mizuho Kitamura, Eiji Maruo, Junichi Hasegawa, Noriko Kaneda, Hirofumi Takada
Publikováno v:
International Journal of Clinical Oncology. 19:397-402
It was recently reported that genetic polymorphisms of UDP glucuronyltransferase-1 polypeptide A1 (UGT1A1), a glucuronidation enzyme, were associated with irinotecan (CPT-11) metabolism. The active metabolite of CPT-11, 7-ethyl-10-hydroxycamptothecin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8a60f2b48c97c9b230f2d542acffce20
https://doi.org/10.1007/s10147-013-0558-1
https://doi.org/10.1007/s10147-013-0558-1
Publikováno v:
Transactions of the Japan Society of Mechanical Engineers Series B. 76:2264-2271
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1447ee41831ea6b2b599b4edd366e714
https://doi.org/10.1299/kikaib.76.772_2264
https://doi.org/10.1299/kikaib.76.772_2264
Publikováno v:
Journal of the Japan Petroleum Institute. 45:256-259
The hydrodechlorination of chloromethanes over Pd/SiO2 gave higher hydrocarbons selectively. The produced hydrocarbons followed well the Schulz-Flory distribution, indicating that the hydrocarbons were formed via polymerization of surface C1 species.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::117743c3b98d13e0abc82081ee1d35c0
https://doi.org/10.1627/jpi.45.256
https://doi.org/10.1627/jpi.45.256
Publikováno v:
Journal of The Electrochemical Society. 141:192-205
The surface of positive photoresist is hardened by the ion implantation process and becomes very difficult to remove thereafter. To investigate this phenomenon, the following aspects of photoresist were investigated: (i) the effectiveness of low‐en
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::913f8d28f2a8cbdc6c642a148fa19a42
https://doi.org/10.1149/1.2054683
https://doi.org/10.1149/1.2054683
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 6:269-273
Addition of appropriate surfactant to developer will improve wettability of the developer, thus promoting uniformity of dissolution of exposed photoresist. Surface smoothness of the Si substrate is also improved when developer contains surfactant. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::812c3e5a3e587788885ee4be07d90434
https://doi.org/10.1109/66.238177
https://doi.org/10.1109/66.238177
Publikováno v:
Journal of The Electrochemical Society. 139:1721-1730
The addition of small amounts of surfactant and hydrogen peroxide (H 2 O 2 ) to the developer is shown to improve the performance of the photoresist development process. Exposed photoresist areas are dissolved more uniformly, the smoothness of Si sur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::00157985d74574f6f21b938769daf1c1
https://doi.org/10.1149/1.2069483
https://doi.org/10.1149/1.2069483
Autor:
Kenji Dohden, Kouichi Hirose, Takashi Iwa, Hiroshi Hikishima, Toshihiko Nakamura, Kenji Ohmura, Touru Watanabe
Publikováno v:
The Japanese Journal of Gastroenterological Surgery. 23:2818-2822
局所性門脈圧亢進症を伴った膵尾部の仮性嚢胞の1例に対し, 手術前後にendoscopic ultrasonography (以下EUSと略) を施行し, 術式の決定および胃静脈瘤の改善の評価に有用であったので報告する.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::820555822457467c09a19912e518f2a1
https://doi.org/10.5833/jjgs.23.2818
https://doi.org/10.5833/jjgs.23.2818
Publikováno v:
Shigen-to-Sozai. 106:787-792
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4290588b0a7a3adb8927ff2c517f9929
https://doi.org/10.2473/shigentosozai.106.787
https://doi.org/10.2473/shigentosozai.106.787
Publikováno v:
The Proceedings of Autumn Conference of Tohoku Branch. :73-74
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9b3baaf8757011e97febfc77f3926e4
https://doi.org/10.1299/jsmetohoku.2008.44.73
https://doi.org/10.1299/jsmetohoku.2008.44.73
Publikováno v:
The Proceedings of Conference of Tohoku Branch. :158-159
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc8c7907af01e51e6bf58b52654da992
https://doi.org/10.1299/jsmeth.2005.40.158
https://doi.org/10.1299/jsmeth.2005.40.158