Výsledky vyhledávání - "Kosuke Osuga"

Reduction in plasma potential by applying negative DC cathode bias in RF magnetron sputtering

Autor: Masao Isomura, Kosuke Osuga, Haruo Shindo, Toshinori Yamada

Publikováno v: Japanese Journal of Applied Physics. 55:116201

We applied a negative DC bias voltage to the cathode of an RF magnetron sputtering system and successfully reduced the plasma potential in both argon plasma and hydrogen-diluted argon plasma. The crystallinity of the deposited Ge films is improved by

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::03b4f2e88e6b813754308795ed3db896
https://doi.org/10.7567/jjap.55.116201

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