Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Konsta Airola"'
Autor:
Ville A. Lovikka, Konsta Airola, Emily McGuinness, Chao Zhang, Marko Vehkamäki, Marianna Kemell, Mark Losego, Mikko Ritala, Markku Leskelä
Selective deposition of hybrid and inorganic materials inside nanostructures could enable major nanotechnological advances. However, inserting ready-made composites inside nanocavities may be difficult, and therefore, stepwise approaches are needed.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d79f95441a4603d3049a2209e0590d14
http://hdl.handle.net/10138/355898
http://hdl.handle.net/10138/355898
Autor:
Konsta Airola, Stefan Mertin, Jari Likonen, Enni Hartikainen, Kenichiro Mizohata, James Dekker, Abhilash Thanniyil Sebastian, Tuomas Pensala
Publikováno v:
Airola, K, Mertin, S, Likonen, J, Hartikainen, E, Mizohata, K, Dekker, J R, Thanniyil Sebastian, A & Pensala, T 2022, ' High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching ', Materialia, vol. 22, 101403 . https://doi.org/10.1016/j.mtla.2022.101403
We report on the anisotropic wet etching of sputtered AlN and Sc0.2Al0.8N thin films. With tetramethyl ammonium hydroxide at 80 °C, the etch rates along the c-axis were 330 and 30 nm/s for AlN and Sc0.2Al0.8N, respectively. Although the etching was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5e3da94ef18b5ad998c61e1fb4fdbcf
https://doi.org/10.1016/j.mtla.2022.101403
https://doi.org/10.1016/j.mtla.2022.101403
