Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Konrad K.-L. Young"'
Autor:
Samuel C. Pan, Michael Shien-Yang Wu, Mango C.-T. Chao, Tseng-Chin Luo, Chin. C. Hsia, Chuen-Uan Huang, Huan-Chi Tseng, Philip A. Fisher, Kuo-Tsai Li, Yuan-Yao Chang, Konrad K.-L. Young
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 24:280-293
As process technologies continually advance, local process variation has greatly increased and gradually become one of the most critical factors for integrated circuit manufacturing. To monitor local process variation, a large number of devices-under
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48ac84e3bba697d53ceeddf30d7f2ee6
https://doi.org/10.1109/tsm.2010.2095891
https://doi.org/10.1109/tsm.2010.2095891
Autor:
Chuen-Uan Huang, Tseng-Chin Luo, Konrad K.-L. Young, Chin. C. Hsia, Huan-Chi Tseng, Samuel C. Pan, Mango C.-T. Chao, Yuan-Yao Chang, Kuo-Tsai Li, Michael S.-Y. Wu
Publikováno v:
ITC
As process technologies continually advance, local process variation has greatly increased and gradually become one of the most critical factors for IC manufacturing. To monitor local process variation, a large number of DUTs (device-under-test) in c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::979f4b05544cd5d8fce7c248214ee299
https://doi.org/10.1109/test.2009.5355656
https://doi.org/10.1109/test.2009.5355656