Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Kojiro Itoh"'
Publikováno v:
Inorganic Chemistry. 39:806-809
Transition metal nitride halides MNX (M = Zr, Hf; X = Cl, Br, I) have two types of layer structured polymorphs, the alpha-form with the FeOCl type and the beta-form with the SmSI type. Both polymorphs consist of corrugated double M-N layers sandwiche
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3431a49033a7ece7d5d18664041dc01c
https://doi.org/10.1021/ic991058l
https://doi.org/10.1021/ic991058l
Autor:
Kaoru Koike, Shinji Kunitani, Hiroshi Sugimura, Hiroshi Arimoto, Kojiro Itoh, Toshiaki Kurosu, Kentaro Ogawa, Takashi Susa, Hideyuki Eguchi, Akira Tamura, Takashi Yoshii, Hiroshi Sakaue
Publikováno v:
SPIE Proceedings.
We examined two EPL mask fabrication processes to control precisely image placement (IP) on the EPL masks. One is a wafer process using an electrostatic chuck during an e-beam write and another is a membrane process using a mechanical chuck during th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c51e7da257778ee3dfab457961bdec81
https://doi.org/10.1117/12.655423
https://doi.org/10.1117/12.655423
Publikováno v:
SPIE Proceedings.
The process of inspection and repair for LEEPL masks is increasingly required. A stencil mask inspection system EBScanner (Tokyo Seimitsu), using transmission electron beam, was investigated defect inspection capability on LEEPL masks. We fabricated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::386f373a32ba2723fe5d6208ef1dbfc9
https://doi.org/10.1117/12.617292
https://doi.org/10.1117/12.617292
Autor:
Takashi Susa, Tomoya Sumida, Kojiro Itoh, Toshiaki Kurosu, Akira Tamura, Hiroshi Sugimura, Kenta Yotsui, Hideyuki Eguchi, Takashi Yoshii
Publikováno v:
SPIE Proceedings.
Two types of strut-supported low energy electron-beam proximity projection lithography (LEEPL) masks which are grid-type mask and COSMOS-type mask, were investigated for Global image placement (IP). First, we evaluated the dynamic repeatability measu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c30ebce0ac3961dd4d914400d00be6e
https://doi.org/10.1117/12.578655
https://doi.org/10.1117/12.578655
Publikováno v:
SPIE Proceedings.
We manufactured LEEPL masks for 65-nm node and evaluated the masks for the critical dimension (CD), image placement (IP) and defects. Although the CD uniformity was 8.0 nm (3σ), an improvement is promising by resist upgrading. The CD linearity was w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40328778f448e2af42c8eed9da8209f7
https://doi.org/10.1117/12.570353
https://doi.org/10.1117/12.570353
Autor:
Takashi Susa, Akira Tamura, Shinji Omori, Tetsuya Kitagawa, Kojiro Itoh, Tomonori Motohashi, Kenta Yotsui, Shinichiro Nohdo
Publikováno v:
SPIE Proceedings.
A production-compatible method for the correction of image-placement (IP) error over a 1x stencil mask as used for proximity electron lithography (PEL) has been demonstrated. The mask IP error as measured using a newly developed metrology tool was fe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35b812d0d73669e0ff0dddbf4b2991c1
https://doi.org/10.1117/12.557821
https://doi.org/10.1117/12.557821
Autor:
Tetsuya Kitagawa, Kojiro Itoh, Satoru Maruyama, Kazuya Iwase, Kenta Yotsui, Shinji Omori, Shoji Nohama, Shigeru Moriya, Akira Tamura, Gaku Suzuki, Yushin Sasaki
Publikováno v:
SPIE Proceedings.
We report the first evaluation results for the printability and detectability of mask defects on a 1x stencil mask as used for proximity electron lithography (PEL). The defect printability has been defined for the patterns after the multi-step etchin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2bf528cadf6c73cffdf166a575d1fe6
https://doi.org/10.1117/12.557822
https://doi.org/10.1117/12.557822
Autor:
Toshiaki Kurosu, Kojiro Itoh, Akira Tamura, Hideyuki Eguchi, Hiroshi Sugimura, Takashi Yoshii
Publikováno v:
SPIE Proceedings.
Membrane stress control is one of the challenges for the commercial success of the stencil masks, such as electron projection lithography (EPL) and low energy electron-beam proximity projection lithography (LEEPL), since a stencil mask has perforatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf5ea44e7d6e3328a7a03ace4d5f9fab
https://doi.org/10.1117/12.519856
https://doi.org/10.1117/12.519856
Autor:
Hiroshi Sugimura, Akira Tamura, Kojiro Itoh, Takashi Yoshii, Toshiaki Kurosu, Hideyuki Eguchi
Publikováno v:
SPIE Proceedings.
We focus on stencil mask technologies for the next generation lithography (NGL) options such as electron projection lithography (EPL) and low energy electron-beam proximity projection lithography (LEEPL). For the production of high-quality stencil ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c8c6362ae30d3bf8b9db126a595f8cf
https://doi.org/10.1117/12.504234
https://doi.org/10.1117/12.504234