Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Koji Takahara"'
Autor:
Kaito Fujitani, Kento Takenaka, Koji Takahara, Hirosuke Sumida, Akinobu Yamaguchi, Yuichi Utsumi, Satoru Suzuki
Publikováno v:
Heliyon, Vol 9, Iss 5, Pp e15794- (2023)
We investigated the mechanism of polytetrafluoroethylene (PTFE) chain scission through in situ hard X-ray photoelectron spectroscopy at room temperature, 200 °C, and 230 °C. The C–C bonds in the main chain and C–F bonds in the side chains were
Externí odkaz:
https://doaj.org/article/384ba0c96e064e3c97e926144587d598
Autor:
Koji Takahara, Satoru Suzuki
Publikováno v:
e-Journal of Surface Science and Nanotechnology. 20:248-251
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. 257:147192
Autor:
Koji Takahara, Satoru Suzuki
Publikováno v:
Journal of Applied Physics. 130:025302
Nanobubble formation by radiolysis of water has been observed in a transmission electron microscope using very high electron dose ratios. Here, surface micro- and nanobubbles were formed in situ in a conventional scanning electron microscope at relat
Publikováno v:
Journal of Sol-Gel Science and Technology. 16:183-193
PLZT((Pb,La)(Zr,Ti)O3) ceramic fibers were prepared by the sol-gel method from a solution of lead acetate trihydrate, lanthanum isopropoxide, zirconium n-propoxide and titanium isopropoxide containing 2-methoxyethanol as the solvent. The as-drawn gel
Publikováno v:
Applied optics. 39(20)
A conventional method to synthesize diffractive optical elements and computer-generated holograms (CGH’s) with high diffraction efficiency relies on an increase of phase levels. To fabricate such a device, one should perform electron-beam (e-beam)
Publikováno v:
Applied optics. 41(13)
Blazed diffractive optical elements (DOEs) were studied for the violet wavelength by electron-beam lithography. By optimizing electron-beam writing parameters and electron-dose distributions, we fabricated eight kinds of grating (period A = 10-0.54 m
Publikováno v:
Diffractive Optics and Micro-Optics.
We have fabricated two-dimensional antireflection structured (ARS) surfaces on a planar fused silica substrate. The ARS surfaces were formed by means of electron beam writing machine. Lift off process of a resist after chrome deposition and reactive
Publikováno v:
Scopus-Elsevier
An antireflection surface with sub-wavelength structure has been successfully fabricated on a fused silica substrate. The fabricated antireflection structured surface consists of a microcone array of fused silica with a period shorter than the wavele