Zobrazeno 1 - 10
of 122
pro vyhledávání: '"Kohlstedt KL"'
Autor:
Chan AM; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States., Ebrahimi SB; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemical and Biomolecular Engineering, Northwestern University, Evanston, Illinois 60208, United States., Samanta D; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States., Leshchev D; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Nijhawan AK; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States., Hsu DJ; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Ho MB; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Ramani N; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Department of Material Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., Kosheleva I; Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois 60637, United States., Henning R; Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois 60637, United States., Mirkin CA; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemical and Biomolecular Engineering, Northwestern University, Evanston, Illinois 60208, United States.; Department of Material Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States., Chen LX; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; International Institute for Nanotechnology, Northwestern University, Evanston, Illinois 60208, United States.; Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne 60439, Illinois, United States.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2024 Dec 11; Vol. 146 (49), pp. 33743-33752. Date of Electronic Publication: 2024 Nov 28.
Autor:
Mahapatra S; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Qian D; Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, United States., Zhang R; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemistry, The University of Hong Kong, Hong Kong SAR 999077, China., Yang S; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Li P; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemistry & Biochemistry, University of Mississippi, University, Mississippi 38677, United States., Feng Y; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemistry and Biochemistry, The University of Oklahoma, Norman, Oklahoma 73019, United States., Zhang L; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Wu H; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemistry, The University of Hong Kong, Hong Kong SAR 999077, China., Seale JSW; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Das PJ; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Jha PK; Department of Chemical Engineering, Indian Institute of Technology, Roorkee, Uttarakhand 247667, India., Kohlstedt KL; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Olvera de la Cruz M; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208, United States.; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., Stoddart JF; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States.; Department of Chemistry, The University of Hong Kong, Hong Kong SAR 999077, China.; Stoddart Institute of Molecular Science, Department of Chemistry, Zhejiang University, Hangzhou 310027, China.; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou 311215, China.; School of Chemistry, University of New South Wales, Sydney, NSW 2052, Australia.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2024 Aug 07; Vol. 146 (31), pp. 21689-21699. Date of Electronic Publication: 2024 Jul 29.
Autor:
Nijhawan AK; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Leshchev D; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Hsu DJ; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Chan AM; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Rimmerman D; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Hong J; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Kosheleva I; Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois 60637, USA., Henning R; Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois 60637, USA., Kohlstedt KL; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA., Chen LX; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2024 Jul 21; Vol. 161 (3).
Autor:
Streater DH; Department of Chemistry, Marquette University, Milwaukee, Wisconsin 53233, United States., Kennehan ER; Magnitude Instruments, 200 Innovation Boulevard Ste. 224, State College, Pennsylvania 16803, United States., Wang D; Department of Chemistry, Boston College, Chestnut Hill, Massachusetts 02467, United States., Fiankor C; Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, United States., Chen L; Department of Chemistry, Boston College, Chestnut Hill, Massachusetts 02467, United States., Yang C; Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States., Li B; Department of Chemistry, Boston College, Chestnut Hill, Massachusetts 02467, United States., Liu D; Department of Chemistry, Wayne State University, Detroit, Michigan 48202, United States., Ibrahim F; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States., Hermans I; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States., Luo L; Department of Chemistry, Wayne State University, Detroit, Michigan 48202, United States., Zhang J; Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States., Huang J; Department of Chemistry, Marquette University, Milwaukee, Wisconsin 53233, United States.; Department of Chemistry, Boston College, Chestnut Hill, Massachusetts 02467, United States.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2024 Feb 21; Vol. 146 (7), pp. 4489-4499. Date of Electronic Publication: 2024 Feb 07.
Autor:
Chan AM; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Nijhawan AK; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Hsu DJ; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Leshchev D; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Rimmerman D; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Kosheleva I; Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois60637, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States., Chen LX; Department of Chemistry, Northwestern University, Evanston, Illinois60208, United States.; Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, Illinois60439, United States.
Publikováno v:
The journal of physical chemistry letters [J Phys Chem Lett] 2023 Feb 09; Vol. 14 (5), pp. 1133-1139. Date of Electronic Publication: 2023 Jan 27.
Autor:
Zeman CJ 4th; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois60208, United States., Kang G; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois60208, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois60208, United States.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2022 Oct 12; Vol. 14 (40), pp. 45644-45657. Date of Electronic Publication: 2022 Oct 03.
Autor:
Streater D; Department of Chemistry, Marquette University, Milwaukee, Wisconsin 53201, United States., Duisenova K; Department of Chemistry, Marquette University, Milwaukee, Wisconsin 53201, United States., Luo J; Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Zhang J; Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, United States.; The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States., Huang J; Department of Chemistry, Marquette University, Milwaukee, Wisconsin 53201, United States.
Publikováno v:
The journal of physical chemistry. A [J Phys Chem A] 2022 Jun 02; Vol. 126 (21), pp. 3291-3300. Date of Electronic Publication: 2022 May 20.
Autor:
Qi F; Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong. alexjen@cityu.edu.hk., Jones LO; Department of Chemistry and the Materials Research Center (MRC), Northwestern University, Evanston, Illinois 60208, USA. t-marks@northwestern.edu., Jiang K; Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong., Jang SH; Department of Materials Science and Engineering, University of Washington, Seattle, Washington 98195-2120, USA., Kaminsky W; Department of Chemistry, University of Washington, Seattle, Washington 98195-2120, USA., Oh J; Department of Energy Engineering, School of Energy and Chemical Engineering, Perovtronics Research Center, Low Dimensional Carbon Materials Center, Ulsan National Institute of Science and Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan 44919, South Korea., Zhang H; State Key Laboratory of Environmental and Biological Analysis, Department of Chemistry, Hong Kong Baptist University, Kowloon, 999077, Hong Kong., Cai Z; State Key Laboratory of Environmental and Biological Analysis, Department of Chemistry, Hong Kong Baptist University, Kowloon, 999077, Hong Kong., Yang C; Department of Energy Engineering, School of Energy and Chemical Engineering, Perovtronics Research Center, Low Dimensional Carbon Materials Center, Ulsan National Institute of Science and Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan 44919, South Korea., Kohlstedt KL; Department of Chemistry and the Materials Research Center (MRC), Northwestern University, Evanston, Illinois 60208, USA. t-marks@northwestern.edu., Schatz GC; Department of Chemistry and the Materials Research Center (MRC), Northwestern University, Evanston, Illinois 60208, USA. t-marks@northwestern.edu., Lin FR; Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong. alexjen@cityu.edu.hk., Marks TJ; Department of Chemistry and the Materials Research Center (MRC), Northwestern University, Evanston, Illinois 60208, USA. t-marks@northwestern.edu., Jen AK; Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong. alexjen@cityu.edu.hk.; Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong.; Department of Materials Science and Engineering, University of Washington, Seattle, Washington 98195-2120, USA.; Department of Chemistry, University of Washington, Seattle, Washington 98195-2120, USA.; Hong Kong Institute for Clean Energy, City University of Hong Kong, Kowloon, 999077, Hong Kong.
Publikováno v:
Materials horizons [Mater Horiz] 2022 Jan 04; Vol. 9 (1), pp. 403-410. Date of Electronic Publication: 2022 Jan 04.
Autor:
Nijhawan AK; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Chan AM; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Hsu DJ; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Chen LX; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, United States., Kohlstedt KL; Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.
Publikováno v:
The journal of physical chemistry. B [J Phys Chem B] 2021 Nov 18; Vol. 125 (45), pp. 12401-12412. Date of Electronic Publication: 2021 Nov 08.
Autor:
Li G; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Zhang X; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan 610054, P.R. China., Jones LO; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Alzola JM; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Mukherjee S; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Feng LW; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Zhu W; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Tianjin Key Laboratory of Molecular Optoelectronic Sciences (TJ-MOS), Department of Chemistry, School of Science, Tianjin University, Tianjin 300072, China., Stern CL; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Huang W; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Yu J; State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan 610054, P.R. China., Sangwan VK; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., DeLongchamp DM; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Kohlstedt KL; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Wasielewski MR; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Hersam MC; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., Schatz GC; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Facchetti A; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Flexterra Corporation, 8025 Lamon Avenue, Skokie, Illinois 60077, United States., Marks TJ; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2021 Apr 28; Vol. 143 (16), pp. 6123-6139. Date of Electronic Publication: 2021 Apr 13.