Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Kohji Katoh"'
Autor:
Kohji Katoh
Publikováno v:
NIPPON GOMU KYOKAISHI. 85:40-45
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14dcc657212241c403405eb13b0f43d5
https://doi.org/10.2324/gomu.85.40
https://doi.org/10.2324/gomu.85.40
Publikováno v:
NIPPON SHOKUHIN KAGAKU KOGAKU KAISHI. 51:565-571
乾熱卵白を添加した中華麺を凍結処理した時の影響について官能試験による評価,力学物性値,麺糊化度より検討した.また走査型電子顕微鏡を用いて凍結中華麺の表面および断面構造を観
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::04d11ea420ad7039e37f0cde8df38486
https://doi.org/10.3136/nskkk.51.565
https://doi.org/10.3136/nskkk.51.565
Publikováno v:
Journal of Photopolymer Science and Technology. 17:247-252
A novel thermal-stable positive-tone photodefinable material has been proposed which applies chemical amplification system to a poly(benzoxazole). To fabricate thick film and also to obtain high dissolution contrast, we paid attention to a three-comp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d52578a1e46f83cf34d01ea08226193
https://doi.org/10.2494/photopolymer.17.247
https://doi.org/10.2494/photopolymer.17.247
Publikováno v:
NIPPON SHOKUHIN KAGAKU KOGAKU KAISHI. 51:456-462
乾熱卵白を生中華麺に添加した時の影響について力学物性値の測定と官能試験の結果より評価した.また走査型電子顕微鏡を用いて中華麺の表面および断面構造を解析することにより,以
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30fa332d71f0a3beacf47e9f05b257ab
https://doi.org/10.3136/nskkk.51.456
https://doi.org/10.3136/nskkk.51.456
Autor:
Toshio Sakamizu, Tadasi Arai, Yasunori Suzuki, Kohji Katoh, Shou-ichi Uchino, Fumio Murai, Hiroshi Shiraishi
Publikováno v:
Journal of Photopolymer Science and Technology. 11:547-552
The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b53ded3dfe13530b8c2f05d1fc3ac660
https://doi.org/10.2494/photopolymer.11.547
https://doi.org/10.2494/photopolymer.11.547
Publikováno v:
Journal of Photopolymer Science and Technology. 10:625-628
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::509d49c37b9a669aab1db8d738f3ccdf
https://doi.org/10.2494/photopolymer.10.625
https://doi.org/10.2494/photopolymer.10.625
Autor:
Hiroko SAGARA, Kouji YOSHIKAWA, Isao TOMIZAWA, Yoshihiko TAKIZAWA, Yoshiro NITTA, Takafumi TSUNODA, Hiroyuki FUKUDA, Tsuyoshi YAMAGUCHI, Gohta MASUDA, Masayoshi NEGISHI, Atsushi AJISAWA, Misako MURATA, Kenji OHNISHI, Shoichiro IRIMAJIRI, Mitsuo OBANA, Fumio MATSUMOTO, Takero IMAI, Iwao SAKURAI, Takayuki TAKAHASHI, Masamiki MORI, Yoshiki MIZUNO, Kohji KATOH, Shiro HOSODA, Tadao BAMBA, Masaya SASAKI, Kunio YOSHIKAWA, Shuichi HIROTANI, Takeshi OGASAWARA, Hitoshi SAKUMOTO, Yasunobu KOMAI, Hideo OOKUBO, Young Ki KIM, Shinobu NAKAJO, Hirozumi OBATA, Yoshihiro SAKAUE, Hideki YOSHIDA, Tetsushi GOTO, Tadakazu AISAKA, Motoko MIKAMI, Kazunori KAGAWA, Yatsuka IMAGAWA, Masafumi FUKUYAMA, Yoshio MATSUBARA, Makoto SAITO
Publikováno v:
Journal of the Japanese Association for Infectious Diseases. 70:60-72
A clinical study was carried out on pazufloxacin (PZFX) in 137 patients including shigellosis, Salmonella enteritis, enteropathogenic Esherichia coli enteritis and cholera, and carriers of these pathogens. Antibacterial activity of PZFX against clini
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c31c85459238dac2c0a38672e3d7933
https://doi.org/10.11150/kansenshogakuzasshi1970.70.60
https://doi.org/10.11150/kansenshogakuzasshi1970.70.60
Publikováno v:
Journal of Photopolymer Science and Technology. 8:21-28
Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93aa130ad7d6ae93477138b673e38906
https://doi.org/10.2494/photopolymer.8.21
https://doi.org/10.2494/photopolymer.8.21
Autor:
Takashi Soga, Hiroshi Shiraishi, Hidetaka Saitoh, Toshio Sakamizu, Morihisa Hoga, Tadashi Arai, Kei Kasuya, Kohji Katoh
Publikováno v:
SPIE Proceedings.
We have developed a novolak-based chemical-amplification resist for 0. 13-rim or later reticle fabrication. Forthe 0. 13.jim or later design-rule reticle-fabrication with OPC patterns, the resist resolution is required under 0.2-.tm on the mask subst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06539e0cc683e3f815079276a10e49be
https://doi.org/10.1117/12.392065
https://doi.org/10.1117/12.392065
Autor:
Hidetaka Saitoh, Tadashi Arai, Toshio Sakamizu, Hidetoshi Satoh, Kei Kasuya, Kohji Katoh, Morihisa Hoga
Publikováno v:
SPIE Proceedings.
We have been developing novolak-based chemically amplified positive resists for the next generation photomask fabrication. In this paper, we report two different types of EB resists: RE-5150P and RE-5160P. Our resist materials consist of four compone
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::adb2127c07c4d18a6ad956e2b1989632
https://doi.org/10.1117/12.373354
https://doi.org/10.1117/12.373354