Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Kohei Suda"'
Autor:
Shun Kobayashi, Makoto Aoki, Mitsuru Wakisaka, Teppei Kawamoto, Ryo Shirasaka, Kohei Suda, Donald A. Tryk, Junji Inukai, Toshihiro Kondo, Hiroyuki Uchida
Publikováno v:
ACS Omega, Vol 3, Iss 1, Pp 154-158 (2018)
Externí odkaz:
https://doaj.org/article/6072ace9c2df40c194a358ca51c6cbf6
Autor:
Shin-ichi Towata, Tatsuo Noritake, Satoshi Ogawa, Yuuki Nakanishi, Yasuhiro Sakuma, Shoji Tachiki, Toshiki Hirotomo, Kohei Suda
Publikováno v:
Journal of Alloys and Compounds. 938:168594
Autor:
Kazutoshi Yoshioka, Kohei Suda, Gai Ogasawara, Atsushi Ogura, Yuki Takahashi, Ryo Yokogawa, Ichiro Hirosawa
Publikováno v:
ECS Transactions. 98:481-490
Ge1-x Sn x is expected to be a new material for next-generation electronic and thermoelectric device because it has higher carrier mobilities and lower thermal conductivity than pure Si and Ge. Here, strain is an important factor for designing electr
Autor:
Kohei Suda, Sumitaka Watanabe, Arata Chisato, Akihiro Iiyama, Tetsuro Tano, Amemiya Isao, Masashi Matsumoto, Makoto Uchida, Hideto Imai, Ryo Kobayashi, Katsuyoshi Kakinuma
Publikováno v:
ACS Applied Materials & Interfaces. 11:34957-34963
Semiconducting oxide nanoparticles are strongly influenced by surface-adsorbed molecules and tend to generate an insulating depletion layer. The interface between a noble metal and a semiconducting oxide constructs a Schottky barrier, interrupting th
Publikováno v:
ECS Transactions. 86:329-336
Background and purpose Ge1-xSnx has a higher electron and hole mobility than Si, which attract much attention as a next-generation channel material [1]. Moreover, it is expected further mobility enhancement by applying appropriate strain. However, th
Publikováno v:
ECS Transactions. 86:411-418
Autor:
Ichiro Hirosawa, Kohei Suda, Hideto Imai, Satoshi Yasuno, Takeshi Watanabe, Junji Inukai, Teppei Kawamoto, Masashi Matsumoto, Tomoyuki Koganezawa
Publikováno v:
ECS Meeting Abstracts. :1489-1489
Autor:
Hiroshi Sudoh, Masato Ishikawa, Yoshio Ohshita, Kohei Suda, Atsushi Ogura, Naomi Sawamoto, Hideaki Machida, Ichiro Hirosawa
Publikováno v:
Journal of Crystal Growth. 468:605-609
In this paper, we propose a new method of using H2 supply in the atmosphere to increase Sn concentration in a Ge1−xSnx film epitaxially grown on a Ge substrate using MOCVD (metal organic chemical vapor deposition). H2 supplied in the atmosphere acc
Autor:
Katsuyoshi, Kakinuma, Kohei, Suda, Ryo, Kobayashi, Tetsuro, Tano, Chisato, Arata, Isao, Amemiya, Sumitaka, Watanabe, Masashi, Matsumoto, Hideto, Imai, Akihiro, Iiyama, Makoto, Uchida
Publikováno v:
ACS applied materialsinterfaces. 11(38)
Semiconducting oxide nanoparticles are strongly influenced by surface-adsorbed molecules and tend to generate an insulating depletion layer. The interface between a noble metal and a semiconducting oxide constructs a Schottky barrier, interrupting th
Autor:
Satoshi Yasuno, Kohei Suda, Teppei Kawamoto, Masashi Matsumoto, Junji Inukai, Tomoyuki Koganezawa, Ichiro Hirosawa, Hideto Imai, Takeshi Watanabe
Publikováno v:
Journal of The Electrochemical Society. 168:054506
We have developed an operando analytical system designed for the simultaneous measurements of the electrochemical reaction rate and the hard X-ray photoemission spectrum. In this system, a solution containing reactants was continuously supplied in a