Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers.

Autor: Putranto AF; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Petit-Etienne C; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Cavalaglio S; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Cabannes-Boué B; CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France., Panabiere M; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Forcina G; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Fleury G; CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France., Kogelschatz M; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France., Zelsmann M; CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France.

Publikováno v: ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 May 29; Vol. 16 (21), pp. 27841-27849. Date of Electronic Publication: 2024 May 17.

SiON and SiO 2/HfSiON gate oxides time dependent dielectric breakdown measurements at nanoscale in ultra high vacuum

Autor: Delcroix, P. ^{a, b, ⁎}, Blonkowski, S. ^a, Kogelschatz, M. ^b, Rafik, M. ^a, Gourhant, O. ^a, JeanJean, D. ^a, Beneyton, R. ^a, Roy, D. ^a, Federspiel, X. ^a, Martin, F. ^c, Garros, X. ^c, Grampeix, H. ^c, Gassilloud, R. ^c

Publikováno v: In Microelectronic Engineering 2011 88(7):1376-1379

Resistive switching study in HfO2 based resistive memories by conductive atomic force microscopy in vacuum.

Autor: Singh, A. K., Blonkowski, S., Kogelschatz, M.

Publikováno v: Journal of Applied Physics; 2018, Vol. 124 Issue 1, pN.PAG-N.PAG, 12p, 2 Diagrams, 1 Chart, 8 Graphs

Self-assembled block polymer templates as high resolution lithographic masks

Autor: Aissou, K. ^{a, ⁎}, Kogelschatz, M. ^a, Baron, T. ^a, Gentile, P. ^b

Publikováno v: In Surface Science 2007 601(13):2611-2614

Resistive Switching Study in OxRAM by Conductive Atomic Force Microscopy in Vacuum Environment

Autor: Singh, A., Blonkowski, S., Kogelschatz, M.

Publikováno v: MRS Spring Meeting 2018
MRS Spring Meeting 2018, 2018, Phoenix, USA, United States

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::dad95d0fa25b10d88432737453404b69
https://hal.univ-grenoble-alpes.fr/hal-01959011