Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Koepfli SM"'
Autor:
Bisang D; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Horst Y; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Thürig M; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Menachery K; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Koepfli SM; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Kohli M; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., De Leo E; Polariton Technologies AG, 8134 Adliswil, Switzerland., Destraz M; Polariton Technologies AG, 8134 Adliswil, Switzerland., Tedaldi V; Polariton Technologies AG, 8134 Adliswil, Switzerland., Del Medico N; Polariton Technologies AG, 8134 Adliswil, Switzerland., Hoessbacher C; Polariton Technologies AG, 8134 Adliswil, Switzerland., Baeuerle B; Polariton Technologies AG, 8134 Adliswil, Switzerland., Heni W; Polariton Technologies AG, 8134 Adliswil, Switzerland., Leuthold J; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland.; Polariton Technologies AG, 8134 Adliswil, Switzerland.
Publikováno v:
ACS photonics [ACS Photonics] 2024 Jun 28; Vol. 11 (7), pp. 2691-2699. Date of Electronic Publication: 2024 Jun 28 (Print Publication: 2024).
Autor:
Wyss RM; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany.; Soft Materials, Department of Materials, ETH Zürich, 8093 Zürich, Switzerland., Kewes G; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany., Marabotti P; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany., Koepfli SM; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Schlichting KP; Laboratory of Thermodynamics in Emerging Technologies Department of Mechanical and Process Engineering, ETH Zürich, 8092 Zürich, Switzerland., Parzefall M; Photonics Lab, ETH Zürich, 8093 Zürich, Switzerland., Bonvin E; Photonics Lab, ETH Zürich, 8093 Zürich, Switzerland., Sarott MF; Department of Materials, ETH Zürich, 8093 Zürich, Switzerland., Trassin M; Department of Materials, ETH Zürich, 8093 Zürich, Switzerland., Oezkent M; Leibniz-Institut für Kristallzüchtung, 12489, Berlin, Germany., Lu CH; Leibniz-Institut für Kristallzüchtung, 12489, Berlin, Germany., Gradwohl KP; Leibniz-Institut für Kristallzüchtung, 12489, Berlin, Germany., Perrault T; Institut des Molécules et Matériaux du Mans, UMR 6283 CNRS, Le Mans Université, 72085, Le Mans, France., Habibova L; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany., Marcelli G; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany., Giraldo M; Department of Materials, ETH Zürich, 8093 Zürich, Switzerland., Vermant J; Soft Materials, Department of Materials, ETH Zürich, 8093 Zürich, Switzerland., Novotny L; Photonics Lab, ETH Zürich, 8093 Zürich, Switzerland., Frimmer M; Photonics Lab, ETH Zürich, 8093 Zürich, Switzerland., Weber MC; Institut des Molécules et Matériaux du Mans, UMR 6283 CNRS, Le Mans Université, 72085, Le Mans, France., Heeg S; Institut für Physik und IRIS Adlershof, Humboldt-Universität zu Berlin, 12489, Berlin, Germany. sebastian.heeg@physik.hu-berlin.de.
Publikováno v:
Nature communications [Nat Commun] 2024 Jun 19; Vol. 15 (1), pp. 5236. Date of Electronic Publication: 2024 Jun 19.
Autor:
Nashashibi S; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Koepfli SM; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Schwanninger R; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Baumann M; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Doderer M; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Bisang D; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Fedoryshyn Y; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland., Leuthold J; ETH Zurich, Institute of Electromagnetic Fields, Zurich 8092, Switzerland.
Publikováno v:
ACS nano [ACS Nano] 2024 May 21; Vol. 18 (20), pp. 12760-12770. Date of Electronic Publication: 2024 May 10.
Autor:
Koepfli SM; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Baumann M; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Koyaz Y; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Gadola R; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Güngör A; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Keller K; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Horst Y; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Nashashibi S; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Schwanninger R; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Doderer M; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Passerini E; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Fedoryshyn Y; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland., Leuthold J; Institute of Electromagnetic Fields (IEF), ETH Zürich, 8092 Zürich, Switzerland.
Publikováno v:
Science (New York, N.Y.) [Science] 2023 Jun 16; Vol. 380 (6650), pp. 1169-1174. Date of Electronic Publication: 2023 Jun 15.
Autor:
Schwanninger R; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Koepfli SM; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Yarema O; Institute for Electronics, ETH Zurich, 8092 Zurich, Switzerland., Dorodnyy A; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Yarema M; Institute for Electronics, ETH Zurich, 8092 Zurich, Switzerland., Moser A; Institute for Electronics, ETH Zurich, 8092 Zurich, Switzerland., Nashashibi S; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Fedoryshyn Y; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland., Wood V; Institute for Electronics, ETH Zurich, 8092 Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields, ETH Zurich, 8092 Zurich, Switzerland.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2023 Mar 01; Vol. 15 (8), pp. 10847-10857. Date of Electronic Publication: 2023 Feb 16.
Autor:
Gungor AC; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Koepfli SM; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Baumann M; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Ibili H; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Smajic J; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland.
Publikováno v:
Materials (Basel, Switzerland) [Materials (Basel)] 2022 Jun 10; Vol. 15 (12). Date of Electronic Publication: 2022 Jun 10.
Autor:
Christidis G; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Fabrichnaya OB; Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany., Koepfli SM; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Poloni E; Department of Materials. ETH Zurich, Complex Materials, 8093 Zurich, Switzerland., Winiger J; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Fedoryshyn YM; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Gusarov AV; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Ilatovskaia M; Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany., Saenko I; Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany., Savinykh G; Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany., Shklover V; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland.
Publikováno v:
Journal of materials science [J Mater Sci] 2021; Vol. 56 (33), pp. 18440-18452. Date of Electronic Publication: 2021 Oct 07.
Autor:
Dorodnyy A; Institute of Electromagnetic Fields, ETH Zurich, Zurich, Switzerland. alexander.dorodnyy@ief.ee.ethz.ch., Koepfli SM; Institute of Electromagnetic Fields, ETH Zurich, Zurich, Switzerland., Lochbaum A; Institute of Electromagnetic Fields, ETH Zurich, Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields, ETH Zurich, Zurich, Switzerland.
Publikováno v:
Scientific reports [Sci Rep] 2020 Oct 21; Vol. 10 (1), pp. 17941. Date of Electronic Publication: 2020 Oct 21.
Autor:
Lochbaum A; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Dorodnyy A; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Koch U; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Koepfli SM; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Volk S; Materials and Device Engineering (MaDE) Group, ETH Zurich, 8092 Zurich, Switzerland., Fedoryshyn Y; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Wood V; Materials and Device Engineering (MaDE) Group, ETH Zurich, 8092 Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland.
Publikováno v:
Nano letters [Nano Lett] 2020 Jun 10; Vol. 20 (6), pp. 4169-4176. Date of Electronic Publication: 2020 May 14.
Autor:
Hernandez Oendra AC; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., De Leo E; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Koepfli SM; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Winkler JM; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Rossinelli AA; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Riedinger A; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Norris DJ; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland., Prins F; Optical Materials Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich, Rämistrasse 101, Zürich 8092, Switzerland.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2020 Jun 10; Vol. 12 (23), pp. 26601-26606. Date of Electronic Publication: 2020 May 26.