Výsledky vyhledávání - "Kniknie, B.J."

Identifying parasitic current pathways in CIGS solar cells by modelling dark J-V response

Autor: Bakker, N.J., Creatore, M., Schropp, R.E.I., Kessels, W.M.M., Williams, B.L., Smit, S., Kniknie, B.J., Keuning, W.

Publikováno v: Progress in Photovoltaics: Research and Applications, 23(11), 1516-1525. Wiley
Progress in Photovoltaics: Research and Applications, 11, 23, 1516-1525

An equivalent circuit model, which allows for the presence of three types of shunting pathways, has been developed to describe the dark J-V characteristics in CIGS solar cells. Excellent agreement between the model and experimental data was apparent

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Impact of the Cd2+ treatment on the electrical properties of Cu2ZnSnSe4 and Cu(In,Ga)Se2 solar cells

Autor: Ben Messaoud, K., Buffière, M., Brammertz, G., ElAnzeery, H., Oueslati, S., Hamon, J., Kniknie, B.J., Meuris, M., Amlouk, M., Poortmans, J.

Publikováno v: Progress in Photovoltaics: Research and Applications, 11, 23, 1608-1620

Modification of the absorber surface properties by Cd2+ treatment (Cd2+ partial electrolyte) results in the following: formation of Cd(OH)2 on the absorber surface, deposition of thinner chemical bath-deposited CdS buffer layer, and a smaller space c

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Expanding thermal plasma chemical vapour deposition of ZnO:Al layers for CIGS solar cells

Autor: Bakker, N.J., Creatore, M., Knoops, H.C.M., Kessels, W.M.M., Williams, B.L., Kniknie, B.J., Sharma, K., Mittal, A.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::8a84803dc71b5ff41bb8fbd23b2a716a
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APCVD of ZnO: Al, insight and control by modeling

Autor: Deelen, J. van, Illiberi, A., Kniknie, B.J., Steijvers, H.L.A.H., Lankhorst, A.M., Simons, P.J.P.M.

Publikováno v: Surface and Coatings Technology, 230, 239-244

Atmospheric pressure chemical vapor deposition (APCVD) of ZnO from diethyl zinc (DEZn) and t-butanol was performed using an industrial reactor design. Deposition profiles were recorded to gain insight in the position dependent variations in layer thi

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A new concept for spatially divided deep reactive ion etching with ALD based passivation

Autor: Roozeboom, F., Kniknie, B.J., Lankhorst, A.M., Winands, G.J.J., Knaapen, R., Smets, M., Poodt, P., Dingemans, G., Keuning, W., Kessels, W.M.M., Kondo, K., Pdolaha-Murphy, E.J., Mathad, S.

Publikováno v: Processing Materials of 3D Interconnects, Damascene and Electronics Packaging 4 (PRiME 2012), October 7, 2012-October 12, 2012, Honolulu, HI, 73-82
STARTPAGE=73;ENDPAGE=82;TITLE=Processing Materials of 3D Interconnects, Damascene and Electronics Packaging 4 (PRiME 2012), October 7, 2012-October 12, 2012, Honolulu, HI
32, 50, 73-82

Conventional Deep Reactive Ion Etching (DRIE) is a plasma etch process with alternating half-cycles of 1) Si-etching with SF6 to form gaseous SiFx etch products, and 2) passivation with C4F8 polymerizing as a protecting fluorocarbon deposit on the si

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dbfd9f026d1c9eb045d4821684e51572
https://research.tue.nl/en/publications/9f3f5118-ad7b-4845-8b55-37f8f7b1b539

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Atmospheric pressure deposition of SnO2 and ZnO

Autor: Deelen, J. van, Kniknie, B.J., Grob, F.T.J., Volintiru, I., Roozeboom, F., Poodt, P.W.G., Illiberi, A.

Publikováno v: 38th IEEE Photovoltaic Specialists Conference, PVSC 2012, 3 June 2012 through 8 June 2012, Austin, TX, USA, 2014-2017

Transparent conductive oxide (TCO) coated glass is widely used in thin film PV. Atmospheric pressure chemical vapor deposition (APCVD) is a highly cost effective method of deposition and apart from metal precursor and oxygen precursor, other additive

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Patterned deposition by atmospheric pressure plasma-enhanced spatial atomic layer deposition

Autor: Poodt, P., Kniknie, B.J., Branca, A., Winands, G.J.J., Roozeboom, F.

Publikováno v: Physica Status Solidi : Rapid Research Letters, 5(4), 165-167. Wiley-VCH Verlag

An atmospheric pressure plasma enhanced atomic layer deposition reactor has been developed, to deposit Al2O3 films from trimethyl aluminum and an He/O2 plasma. This technique can be used for 2D patterned deposition in a single in-line process by maki

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