Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Klaus-Dieter Roth"'
Autor:
F. Kern, Otto Vostrowsky, Barbara Leinemann, Claudia Rehefeld, Klaus-Dieter Roth, Hans Jürgen Bestmann
Publikováno v:
Bioorganic & Medicinal Chemistry. 4:473-477
Conformational analyses of (Z)-5-decenylacetate, a sex pheromone component of the turnip moth, Agrotis segetum, and double unsaturated pheromone analogues 4 and 5 have been performed by ab initio calculations using Gaussian 92. Two minima were found
Publikováno v:
Journal of Organometallic Chemistry. 493:113-118
The novel metallacyclic alkenylcobaltcarbene complex 2a is readily available by Meerwein alkylation of the underlying cobaltalactone 4a . Although having very similar structures (X-ray analyses) and electron transfer behaviour (cyclic voltammetry), 2
Autor:
Klaus-Dieter Roth
Publikováno v:
Tetrahedron Letters. 35:3505-3508
Reactions of molybdenum stabilized propargyl cations 2 with enamines are described, constituting a molybdenum mediated analogue of the Nicholas reaction and extending the scope of propargylations of enamines by means of transition metal complexed car
Autor:
Klaus-Dieter Roth, Utz Müller
Publikováno v:
Tetrahedron Letters. 34:2919-2922
An efficient synthesis of mono- and bispropargylated tertiary amines is described, using the Nicholas reaction with primary and secondary amines as nucleophiles.
Autor:
Klaus-Dieter Roth
Publikováno v:
Synlett. 1993:529-533
Autor:
Klaus-Dieter Roth
Publikováno v:
ChemInform. 25
Autor:
Klaus-Dieter Roth
Publikováno v:
Synlett. 1992:435-438
Publikováno v:
23rd European Mask and Lithography Conference.
The development of reticles for the 65nm node is already completed and development is ongoing at the leading edge mask shops for 45nm technology node reticles. The specifications for 45 nm node reticles CD homogeneity, CD mean to target, and registra
Autor:
Klaus-Dieter Roth, Walter Steinberg, Jochen Bender, Gerhard Schluter, Michael Ferber, Frank Hillmann, Gerd Scheuring
Publikováno v:
SPIE Proceedings.
For 65nm photo mask lithography, metrology becomes significantly more important. Especially the requirements of the photo mask users versus critical dimension (CD) control, CD homogeneity and CD mean to target, give strong head-aches to lithography a
Autor:
Peter Speckbacher, Bernd Brendel, Thomas Engel, Lutz Bettin, Bertram Hauffe, Wolfgang Sedlmeier, Werner Mirande, Klaus-Dieter Roth, Hans-Jürgen Brück, Thomas Schatz, Walter Steinberg, Stefan Dobereiner, Wolfgang Hassler-Grohne, Harald Bosse
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
We report on the current status of a project on development and characterization of CD photomasks with 6025 format to be used as reference standards for different type of CD metrology instruments. The project consortium consists of mask suppliers, ma